Wafer table having sensor for immersion lithography
AssigneeNikon Corporation
InventorsAndrew J Hazelton, Hiroaki Takaiwa
Life of this patent
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Abstract
Methods and apparatus allow a liquid to be substantially contained between a lens and a wafer table assembly of an immersion lithography system. According to one example, an exposure apparatus includes a lens and a wafer table assembly. The wafer table assembly has a top surface, and is arranged to support a wafer to be moved with respect to the lens as well as at least one component. The top surface of the wafer and the top surface of the component are each at substantially a same height as the top surface of the wafer table assembly. An overall top surface of the wafer table assembly which includes the top surface of the wafer, the top surface of the wafer table assembly, and the top surface of the at least one component is substantially planar.
Claims29
A liquid immersion exposure apparatus which exposes a substrate with light via a projection optical system and a liquid, the apparatus comprising:
- a liquid containment member arranged around an optical path of the light emitted from the projection optical system, and which forms an immersion area with the liquid under the projection optical system;
- a table assembly having a holder which holds the substrate, and a top surface in which an opening is formed, the holder is arranged in the opening, a surface of the substrate held by the holder is positionable opposite to the projection optical system by the table assembly and is contactable with the liquid of the immersion area;
- a detecting system having a transparent member which is detachably provided on the table assembly, and a detector which detects the light via the transparent member;
- wherein
- a top surface of the transparent member and the top surface of the table assembly are substantially co-planar,
- the transparent member is positionable under the projection optical system by the table assembly, and
- the detector detects the light via the projection optical system, the liquid of the immersion area, and the transparent member, the top surface of which contacts the liquid of the immersion area, positioned under the projection optical system.
A liquid immersion exposure method of exposing a substrate with light via a projection optical system and a liquid, the method comprising:
- holding the substrate with a holder of a table assembly, the holder being arranged in an opening which is formed in a top surface of the table assembly, the table assembly having a transparent member which is detachably provided on the table assembly such that a top surface of the transparent member and the top surface of the table assembly are substantially co-planar;
- moving the table assembly relative to the projection optical system such that the transparent member is positioned under an immersion area, the immersion area being formed with the liquid under the projection optical system by a liquid containment member which is arranged around an optical path of the light emitted from the projection optical system, and the top surface of the transparent member contacting the liquid of the immersion area;
- and
- detecting the light with a detector via the projection optical system, the liquid of the immersion area and the transparent member;
- wherein
- a surface of the substrate held by the holder is positioned opposite to the projection optical system by the table assembly, and contacts the liquid of the immersion area.
The liquid immersion exposure method according to claim. 19, wherein
- the immersion area is maintained by the substrate held by the holder, the top surface of the table assembly or both.
A method of making a liquid immersion exposure apparatus, the method comprising:
- providing a liquid containment member arranged around an optical path of light emitted from a projection optical system of the liquid immersion exposure apparatus, and which forms an immersion area with liquid under the projection optical system;
- providing a table assembly having a holder which holds the substrate, and a top surface in which an opening is formed, the holder is arranged in the opening, a surface of the substrate held by the holder is positionable opposite to the projection optical system by the table assembly and is contactable with the liquid of the immersion area;
- and
- providing a detecting system having a transparent member which is detachably provided on the table assembly, and a detector which detects the light via the transparent member;
- wherein
- a top surface of the transparent member and the top surface of the table assembly are substantially co-planar,
- the transparent member is positionable under the projection optical system by the table assembly, and the detector detects the light via the projection optical system, the liquid of the immersion area, and the transparent member, the top surface of which contacts the liquid of the immersion area, positioned under the projection optical system.
Dependencies are inferred from the claim text.