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US 8,508,716 B2Granted
Homogenizer
AssigneeASML Netherlands B.V.
InventorsBert Jan Claessens, Marcel Mathijs Theodore Marie Dierichs, Herman Philip Godfried
Life of this patent
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Abstract
A two-stage homogenizer comprising a first homogenizer stage and a second homogenizer stage. The first homogenizer stage includes a pair of microlens arrays and associated focusing optics. The second homogenizer stage includes a second pair of microlens arrays and associated focusing optics. The second homogenizer stage is positioned to receive radiation which is output from the first homogenizer stage.
Claims11
A two-stage homogenizer comprising:
- a first homogenizer stage comprising a first pair of microlens arrays and associated focusing optics;
- a second homogenizer stage comprising a second pair of microlens arrays and associated focusing optics, the second homogenizer stage being positioned to receive radiation that is output from the first homogenizer stage, wherein the first and second pairs of microlens arrays are two-dimensional microlens arrays;
- a detector configured to detect a diameter of a radiation beam incident upon the first homogenizer stage;
- and
- a processor configured to determine a peak intensity of the radiation beam in a second microlens array of the second pair of microlens arrays based upon the detected diameter of the radiation beam.
2 more elements
An illumination system comprising:
- a first homogenizer stage comprising a first pair of microlens arrays and associated focusing optics;
- a second homogenizer stage comprising a second pair of microlens arrays and associated focusing optics, the second homogenizer stage being positioned to receive radiation that is output from the first homogenizer stage, wherein the first and second pairs of microlens arrays are two-dimensional microlens arrays;
- an array of individually controllable elements configured to receive radiation output from the second homogenizer stage;
- a detector configured to detect a diameter of a radiation beam incident upon the first homogenizer stage;
- and
- a processor configured to determine a peak intensity of the radiation beam in a second microlens array of the second pair of microlens array based upon the detected diameter of the radiation beam.
3 more elements
A lithographic apparatus comprising:
- a first homogenizer stage comprising a first pair of microlens arrays and associated focusing optics;
- a second homogenizer stage comprising a second pair of microlens arrays and associated focusing optics, the second homogenizer stage being positioned to receive radiation that is output from the first homogenizer stage, wherein the first and second pairs of microlens arrays are two-dimensional microlens arrays;
- an array of individually controllable elements configured to receive radiation output from the second homogenizer stage;
- a detector configured to detect a diameter of a radiation beam incident upon the first homogenizer stage;
- and
- a processor configured to determine a peak intensity of the radiation beam in a second microlens array of the second pair of microlens arrays based upon the detected diameter of the radiation beam.
3 more elements
A method of homogenizing a radiation beam comprising:
- passing the radiation beam through a first pair of microlens arrays;
- passing the radiation beam through focusing optics;
- passing the radiation beam through a second pair of microlens arrays, wherein the first and second pairs of microlens arrays are two-dimensional microlens arrays;
- passing the radiation beam through additional focusing optics;
- detecting a diameter of the radiation beam;
- and
- determining a peak intensity of the radiation beam in a second microlens array of the second pair of microlens arrays based upon the detected radiation beam diameter.
4 more elements
Dependencies are inferred from the claim text.