Exposure apparatus, exposure method, and method for producing device

An immersion exposure apparatus, comprising:

• an optical system via which the exposure beam exits;
• a first stage placing thereon a substrate onto which the exposure beam is irradiated;
• a second stage which is movable independently from the first stage;
• a liquid immersion system which supplies a liquid beneath the optical system and forms a liquid immersion area;
• a bridge member which is provided on the first stage and which has an upper surface retaining the liquid immersion area between the upper surface and the optical system;
• a driving device which moves the first stage and the bridge member relative to each other;
• and
• a driving system which moves the first stage and the second stage so that a change is made from a first stage in which the liquid immersion area is retained between the optical system and the first stage to a second stage in which the liquid immersion area is retained between the optical system and the second stage;
• wherein for an operation of the change, the bridge member is moved in the first stage from a first position to a second position by the driving device so that the upper surface of the bridge member is arranged between the first and second stages;
• the liquid immersion area is retained beneath the optical system and is moved from the first stage to the second stage via the bridge member during the operation of the change;
• and
• the substrate is exposed with the exposure beam via the optical system and the liquid and is moved relative to the liquid immersion area by the first stage during an operation of the exposure.