US 8,508,134 B2Granted

Hall-current ion source with improved ion beam energy distribution

OwnerEvgeny Vitalievich Klyuev, Viacheslav Vasilievich Zhurininventors

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Abstract

A Hall-current ion source with a narrow ion beam energy distribution is presented. A narrow ion beam energy distribution is provided by a utilization of a multi-chamber anode through which a working gas is applied and delivers a uniform working gas distribution in a discharge channel. Introduction of a working gas through a lower part of anode makes applied electric potential in a narrow area and leading to enhanced conditions for a working gas ionization, high ion beam current, high translation of a discharge voltage into a “monochromatic” ion beam mean energy distribution. A multi-chamber anode with a slit exit for introduction of a working gas into area under anode is utilized to prevent a backflow of insulating and dielectric depositions on anode parts, and under anode area makes a nominal operation with reactive gases without a phenomenon called as “anode poisoning” during long operating hours. The ion source with a shielded Hot Filament design shows very effective ion beam neutralization properties; it produces less heating of the substrate than a traditional one; it has a cleaner ion beam because its beam is not contaminated by the Hot Filament material particles. In the design with two Hot Filaments the ion source operation is extended for tens of hours.

Claims4

Dependent claims

A Hall-current ion source with electric potential impressed between a cathode and an anode in a discharge channel, where electrons move in an axial and radial magnetic field in said discharge channel developed by a working gas distributing system, a permanent magnet and an external flange serving as magnetic poles, where electrons move in partially closed drift electron trajectories;

wherein electrons produced by an externally placed cathode collide with neutral particles and generate ions that are not influenced by said magnetic field and move axially to exit said ion source producing plasma flow comprising ions and electrons;
the ion source comprising:
a positively charged hollow cut cone anode positioned in said discharge channel;
wherein said anode comprises multiple chambers for uniform working gas distribution;
wherein said anode further comprises a lower part having a plurality of small holes which communicate between said discharge channel and one of said multiple chambers;
wherein said anode includes an upper part, and wherein the distance between said upper part and said external flange is less than about 20 mm;
a cathode located outside of said discharge channel for producing electrons for working gas ionization and neutralization of generated ions in said discharge channel;
a working gas distributing system imbedded in said anode with an enhanced working gas distribution through said plurality of holes in said anode;
a permanent magnet positioned below said anode;
a reflector comprising an electrically conducting plate positioned on top of said permanent magnet and below said anode's lower part;
said reflector being at a floating electrical potential;
wherein introduction of said working gas through said holes in said anode confines the area of developed ions and electric potential application to said developed ions to produce a narrow ion beam energy distribution where Ei is about (0.8-0.95) eVd±20-25 eV.

9 more elements

wherein electrons produced by an externally placed cathode collide with neutral particles and generate ions that are not influenced by said magnetic field and move axially to exit said ion source producing plasma flow comprising ions and electrons;
the ion source comprising:
a positively charged hollow cut cone positioned in said discharge channel;
wherein said anode comprises multiple chambers for uniform working gas distribution;
wherein said anode further comprises a lower part and an upper part;
wherein said lower part is tapered inwardly and defines a slit gas exit communicating between said discharge channel and one of said multiple chambers;
wherein said tapered lower part further defines an extended surface area thereunder;
wherein the distance between said upper part and said external flange is less than about 20 mm;
a cathode located outside of said discharge channel for producing electrons for working gas ionization and neutralization of generated ions in said discharge channel;
a working gas distributing system imbedded in said anode with an enhanced working gas distribution through said slit gas exit;
a permanent magnet positioned below said anode;
a reflector comprising an electrically conducting plate positioned on top of said permanent magnet and below said anode's lower part;
said reflector being at a floating electrical potential;
wherein introduction of said working gas through said slit gas exit in said anode confines the area of developed ions and electric potential application to said developed ions to produce a narrow ion beam energy distribution where Ei is about (0.8-95)eVd±20-25 eV;
and wherein the ratio of ion beam current to discharge current is about 0.3-0.4.

12 more elements

Dependencies are inferred from the claim text.

Facts

Application: 12/804,763Filed 29 Jul 2010
Published: US 2012/0025710 A12 Feb 2012
Granted: 13 Aug 2013
Term ends: Not estimatedThe source records don’t support an estimate.

Classification8 codes

H01J 27/146
Other arc discharge ion sources using an applied magnetic field: end-Hall type ion sources, wherein the magnetic field confines the electrons in a…
H01J 37/08
Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical…:…
H01J 2237/006
Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging: details of gas supplies, e.g. in an ion source, to a beam…
H01J 2237/022
Details: avoiding or removing foreign or contaminating particles, debris or deposits on sample or tube