Radio frequency device and method for fabricating the same
AssigneeUnited Microelectronics Corp.
InventorsSheng-Yi Huang, Cheng-Chou Hung, Tzung-Lin Li, Chin-Lan Tseng, Victor-Chiang Liang, Chih-Yu Tseng
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Abstract
A radio frequency (RF) device that can achieve high frequency response while maintaining high output impedance and high breakdown voltage includes a substrate, a gate, at least a dummy gate, at least a doped region, a source region and a drain region. The substrate includes a well of first type and a well of second type. The well of second type is adjacent to the well of first type.
Claims19
A radio frequency device, comprising:
- a substrate comprising a well of first type and a well of second type adjacent to the well of first type;
- a dummy gate of first type formed over the well of first type;
- a gate of first type formed over the well of second type;
- a drain region of first type formed in the well of first type and adjacent to the dummy gate of first type;
- a source region of first type formed in the well of second type and adjacent to the gate of first type;
- and
- a doped region of first type formed only in the well of first type and adjacent to the well of second type, wherein the doped region of first type is not directly above the well of second type.
A radio frequency device, comprising:
- a substrate comprising a well of first type and a well of second type adjacent to the well of first type;
- a plurality of dummy gates formed over the well of first type;
- a gate of first type formed over the well of second type;
- a drain region of first type formed in the well of first type and adjacent to one of the dummy gates far away from the gate of first type;
- and
- a source region of first type formed in the well of second type and adjacent to the gate of first type.
A method for fabricating a radio frequency device, comprising:
- providing a substrate comprising a well of first type and a well of second type adjacent to the well of first type;
- forming a dummy gate of first type over the well of first type, and a gate of first type over the well of second type;
- performing a first ion implantation process using the gate of first type and the dummy gate of first type as a mask to form LDD structures in the substrate at two sides of the gate of first type and the dummy gate of first type respectively;
- and
- performing a second ion implantation process to form a drain region of first type in the well of first type and adjacent to the dummy gate of first type, a source region of first type in the well of second type and adjacent to the gate of first type, and a doped region of first type only in the well of first type and adjacent to the well of second type, wherein the doped region of first type is not directly above the well of second type.
A method for fabricating a radio frequency device, comprising:
- providing a substrate comprising a well of first type and a well of second type adjacent to the well of first type;
- forming a plurality of dummy gates over the well of first type, and a gate of first type over the well of second type;
- performing a first ion implantation process using the gate of first type and the dummy gates as a mask to form LDD structures in the substrate at two sides of the gate of first type and the dummy gates respectively;
- and
- performing a second ion implantation process to form a drain region of first type in the well of first type and adjacent to one of the dummy gates far away from the gate of first type, a source region of first type in the well of second type and adjacent to the gate of first type, and a plurality of doped regions in the well of first type and between the source region of first type and the drain region of first type.
Dependencies are inferred from the claim text.