Isolation structures for global shutter imager pixel, methods of manufacture and design structures
AssigneeInternational Business Machines Corporation
InventorsBrent A. Anderson, Mark D. Jaffe
Life of this patent
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Abstract
Pixel sensor cells, e.g., CMOS optical imagers, methods of manufacturing and design structures are provided with isolation structures that prevent carrier drift to diffusion regions. The pixel sensor cell includes a photosensitive region and a gate adjacent to the photosensitive region. The pixel sensor cell further includes a diffusion region adjacent to the gate. The pixel sensor cell further includes an isolation region located below a channel region of the gate and about the photosensitive region, which prevents electrons collected in the photosensitive region to drift to the diffusion region.
Claims22
A pixel sensor cell, comprising:
- a photosensitive region;
- a gate adjacent to the photosensitive region;
- a diffusion region adjacent to the gate;
- an isolation region located below a channel region of the gate and about the photosensitive region which is structured to prevent electrons collected in the photosensitive region to drift to the diffusion region, wherein the isolation region includes a trench with an insulator liner and a conductive material therein;
- and
- the isolation region extends into a P− epi substrate and a P+ substrate.
A design structure comprising instructions tangibly embodied in a machine readable storage medium for designing, manufacturing, or simulating a pixel sensor cell, the instructions when executed on a data processing system generate a functional. representation of the pixel sensor cell, the design structure comprising:
- a photosensitive region;
- a gate adjacent to the photosensitive region;
- a diffusion region adjacent to the gate;
- and
- an isolation region located below a channel region of the gate and about the photosensitive region which prevents electrons collected in the photosensitive region to drift to the diffusion region, wherein the isolation region includes a trench with an insulator liner and a conductive material therein;
- and
- wherein the insulator liner is on a top surface of the isolation region between the channel region of the rate and the conductive material.
Dependencies are inferred from the claim text.