US 8,507,883 B2 · Extreme ultraviolet light source apparatus

Abstract

An extreme ultraviolet light source apparatus provided with a magnetic field forming unit having sufficient capability of protection against ions radiated from plasma while using a relatively small magnetic source. The apparatus includes: a target nozzle for injecting a target material; a driver laser for applying a laser beam to the target material to generate plasma; a collector mirror for collecting extreme ultraviolet light radiated from the plasma; and a magnetic field forming unit including at least one magnetic source and at least one magnetic material having two leading end parts projecting from the at least one magnetic source to face each other with a plasma emission point in between, and forming a magnetic field between a trajectory of the target material and the collector mirror.

Claims19

Dependent claims

An extreme ultraviolet light source apparatus for generating

extreme ultraviolet light by introducing a laser beam and irradiating a target material with the laser beam to turn the target material into plasma, said apparatus comprising:
a chamber in which the extreme ultraviolet light is generated;
a target supply unit configured to supply the target material toward a plasma emission point within said chamber;
a collector mirror configured to collect the extreme ultraviolet light radiated from the plasma;
a first magnetic source;
a first magnetic material to be magnetized by said first magnetic source, said first magnetic material having a leading end portion projecting from an inner wall of said first magnetic source toward the plasma emission point;
a second magnetic source, and
a second magnetic material to be magnetized by said second magnetic source, said second magnetic material having a leading end portion projecting from an inner wall of said second magnetic source toward the plasma emission point,
wherein the leading end portion of said first magnetic material and the leading end portion of said second magnetic material face each other with the plasma emission point in between.

6 more elements

Dependencies are inferred from the claim text.

Extreme ultraviolet light source apparatus

Life of this patent

Extreme ultraviolet light source apparatus

Life of this patent

Abstract

Claims19