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US 8,507,854 B2Granted
Particle beam microscopy system and method for operating the same
AssigneeCarl Zeiss Microscopy GmbH
InventorsWolfram Buehler, Holger Doemer, Matthias Lang, Joerg Stodolka, Peter Roediger, Emmerich Bertagnolli, Heinz Wanzenboeck
Life of this patent
Estimating the term…
Abstract
A particle beam system 1 for cleaning itself comprises an irradiation system to direct electromagnetic radiation onto the surfaces to be cleaned and a supply system 61 to supply a precursor gas to the interior of the vacuum chamber 11 of the particle beam system 1. The precursor gas is activated in a vicinity of the surfaces to be cleaned and is converted into a reaction gas which reacts with the contaminants present on the irradiated surfaces such that said contaminants may be pumped out then.
Claims24
A method of operating a particle beam microscopy system, the method comprising:
- supplying a precursor gas to a vacuum chamber of the particle beam microscopy system, wherein a sample holder is configured to hold a sample in a vacuum chamber;
- directing electromagnetic radiation onto surfaces of at least one of components of the particle beam microscopy system, a sample held by the sample holder, and the sample holder, wherein the electromagnetic radiation is generated by a source of radiation arranged outside of the vacuum chamber;
- transforming the precursor gas near the surfaces into a reaction gas reacting with contaminants present on the surfaces;
- directing a particle beam onto the sample;
- and
- detecting particles emanating from the sample.
3 more elements
A method of operating a particle beam microscopy system, the method comprising:
- supplying a precursor gas to a vacuum chamber of the particle beam microscopy system, wherein a sample holder is configured to hold a sample in a vacuum chamber;
- directing electromagnetic radiation onto surfaces of at least one of components of the particle beam microscopy system, a sample held by the sample holder, and the sample holder, wherein positions of incidence of the electromagnetic radiation onto the surfaces are varied with an actuator;
- transforming the precursor gas near the surfaces into a reaction gas reacting with contaminants present on the surfaces;
- directing a particle beam onto the sample;
- and
- detecting particles emanating from the sample.
3 more elements
A particle beam microscopy system, comprising:
- a vacuum chamber including a chamber wall;
- a vacuum pumping system for generating a vacuum in the vacuum chamber;
- a particle beam column including components arranged therein and configured to generate a particle beam directed onto a sample;
- a sample holder configured to hold a sample in the vacuum chamber;
- a detector for detecting particles emanating from the sample;
- at least one source of electromagnetic radiation;
- and
- a system for supplying a precursor gas into the vacuum chamber,
- further comprising one of the group consisting of a window for transmitting the electromagnetic radiation into the vacuum chamber from the outside thereof, and a light guide for guiding the electromagnetic radiation to the vicinity of the sample holder, wherein the at least one source of electromagnetic radiation is arranged relative to the vacuum chamber such that radiation emitted by the at least one source of electromagnetic radiation is incident on surfaces of components of the particle beam microscopy system and is not incident on the components arranged within the particle beam column.
6 more elements
A particle beam microscopy system, comprising:
- a vacuum chamber including a chamber wall;
- a vacuum pumping system for generating a vacuum in the vacuum chamber;
- a particle beam column including components arranged therein and configured to generate a particle beam directed onto a sample;
- a sample holder configured to hold a sample in the vacuum chamber;
- a detector for detecting particles emanating from the sample;
- at least one source of electromagnetic radiation;
- and
- a system for supplying a precursor gas into the vacuum chamber,
- further comprising one of the group consisting of a window for transmitting the electromagnetic radiation into the vacuum chamber from the outside thereof, and a light guide for guiding the electromagnetic radiation to the vicinity of the sample holder, wherein the at least one source of electromagnetic radiation is arranged relative to the vacuum chamber such that radiation emitted by the at least one source of electromagnetic radiation is incident on electrically conductive surfaces.
6 more elements
A particle beam microscopy system, comprising:
- a vacuum chamber including a chamber wall;
- a vacuum pumping system for generating a vacuum in the vacuum chamber;
- a particle beam column including components arranged therein and configured to generate a particle beam directed onto a sample;
- a sample holder configured to hold a sample in the vacuum chamber;
- a detector for detecting particles emanating from the sample;
- at least one source of electromagnetic radiation;
- and
- a system for supplying a precursor gas into the vacuum chamber,
- further comprising one of the group consisting of a window for transmitting the electromagnetic radiation into the vacuum chamber from the outside thereof, and a light guide for guiding the electromagnetic radiation to the vicinity of the sample holder.
6 more elements
A particle beam microscopy system, comprising:
- a vacuum chamber including a chamber wall;
- a vacuum pumping system for generating a vacuum in the vacuum chamber;
- a particle beam column including components arranged therein and configured to generate a particle beam directed onto a sample;
- a sample holder configured to hold a sample in the vacuum chamber;
- a detector for detecting particles emanating from the sample;
- a system for supplying a precursor gas into the vacuum chamber, and
- at least one source of UV radiation arranged in the vacuum chamber so that UV radiation emitted from the at least one source of UV radiation is incident on surfaces of components of the particle beam microscopy system, the at least one source of UV radiation being connected to electric supply lines.
4 more elements
Dependencies are inferred from the claim text.