Photoresist compositions
AssigneeBASF SE
InventorsHisatoshi Kura, Kaori Sameshima, Kazuhiko Kunimoto, Peter Nesvadba, Masaki Ohwa
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AssigneeBASF SE
InventorsHisatoshi Kura, Kaori Sameshima, Kazuhiko Kunimoto, Peter Nesvadba, Masaki Ohwa
Estimating the term…
The present invention relates to a radically polymerizable composition comprising a hydroxylamine ester used to manufacture color filters. The invention further relates to novel hydroxylamine esters. The invention further relates to the use of hydroxylamine esters in all liquid crystal display components requiring post-baking. The present invention relates to a radically polymerizable composition comprising: (a) at least one alkaline developable resin; (b) at least one acrylate monomer; (c) at least a photoinitiator; (d) at least one hydroxylamine ester compound of formula (I) wherein Ra represents an acyl radical; one of Rb and Rc represents hydrogen and the other one represents a substituent; or Rb and Rc both represent hydrogen or identical or different substituents; or Rb and Rc together represent oxygen; or Rb and Rc together form a ring; R1-R4 each represent C1-C6 alkyl; and R5 and R6 each represent independently of one another hydrogen, C1-C6 alkyl or C6-C10 aryl; or R5 and R6 together represent oxygen.
A radically polymerizable composition comprising:
A hydroxylamine-ester of the formula IC′
A radically polymerizable composition comprising:
Dependencies are inferred from the claim text.