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US 8,507,298 B2Granted
Patterned implant of a dielectric layer
AssigneeVarian Semiconductor Equipment Associates, Inc.
InventorDeepak A. Ramappa
Life of this patent
Estimating the term…
Abstract
At least part of a dielectric layer is implanted to form implanted regions. The implanted regions affect the etch rate of the dielectric layer during the formation of the openings through the dielectric layer. Metal contacts may be formed within these openings. The dielectric layer, which may be SiO2 or other materials, may be part of a solar cell or other device.
Claims18
A method of manufacturing a workpiece comprising:
- forming a dielectric layer over a doped region of a workpiece wherein said doped region comprises a plurality of n-type regions and a plurality of p-type regions;
- performing a patterned implant into said dielectric layer whereby a plurality of implanted regions are formed, wherein said patterned implant comprises implanting an n-type dopant and a p-type dopant whereby said n-type dopant is implanted through said dielectric layer into said plurality of n-type regions and said p-type dopant is implanted through said dielectric layer into said plurality of p-type regions;
- selectively etching said dielectric layer to form a plurality of openings, wherein said doped region of said workpiece is exposed through said plurality of said openings;
- and
- applying a metal layer to said doped region through said openings.
2 more elements
A method of manufacturing a solar cell comprising:
- implanting a solar cell to form a plurality of n-type regions;
- implanting said solar cell to form a plurality of p-type regions;
- forming a dielectric layer over said n-type regions and said p-type regions;
- performing a patterned implant into said dielectric layer whereby a plurality of implanted regions are formed;
- selectively etching said plurality of implanted regions to form a plurality of openings, wherein at least one of said n-type regions and at least one of said p-type regions of said solar cell are exposed through said plurality of said openings;
- and
- applying metal contacts to at least one of said n-type regions and at least one of said p-type regions through said openings.
4 more elements
A method of manufacturing a solar cell comprising:
- implanting a solar cell to form a plurality of n-type regions;
- implanting said solar cell to form a plurality of p-type regions;
- forming a dielectric layer over said n-type regions and said p-type regions;
- performing a patterned implant into said dielectric layer whereby a plurality of implanted regions are formed;
- selectively etching said plurality of implanted regions to form a plurality of openings, wherein at least one of said n-type regions and at least one of said p-type regions of said solar cell are exposed through said plurality of said openings;
- forming a blanket metal layer over said dielectric layer and in said openings;
- removing a portion of said blanket metal layer from said dielectric layer such that said blanket metal layer remains in said openings;
- and
- forming metal contacts on said blanket metal layer in said openings.
6 more elements
Dependencies are inferred from the claim text.