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US 8,507,185 B2Granted
Methods of forming electronic devices
AssigneeRohm and Haas Electronic Materials LLC
InventorsYoung Cheol Bae, Thomas Cardolaccia, Yi Liu
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Abstract
Methods of forming electronic devices are provided. The methods involve alkaline treatment of photoresist patterns and allow for the formation of high density resist patterns. The methods find particular applicability in semiconductor device manufacture.
Claims16
A method of forming an electronic device, comprising:
- (a) providing a semiconductor substrate comprising one or more layers to be patterned;
- (b) applying a first layer of a first photosensitive composition over the one or more layers to be patterned;
- (c) exposing the first layer to activating radiation through a first photomask;
- (d) developing the exposed first layer to form a resist pattern;
- (e) heat treating the resist pattern in a hardbake process;
- (f) treating the hardbaked resist pattern in a spin coating process with a material effective to make alkaline a surface of the resist pattern, wherein the material comprises an aqueous base developer;
- (g) applying a second layer of a second photosensitive composition over the treated resist pattern and the one or more layers to be patterned, wherein the second photosensitive composition comprises a resin component and a photoacid generator;
- (h) exposing the second layer to activating radiation;
- and
- (i) developing the exposed second layer, leaving a portion of the second layer after development.
7 more elements
A method of forming an electronic device, comprising:
- (a) providing a semiconductor substrate comprising one or more layers to be patterned;
- (b) applying a first layer of a first photosensitive composition over the one or more layers to be patterned;
- (c) exposing the first layer to activating radiation through a first photomask;
- (d) developing the exposed first layer to form a resist pattern;
- (e) heat treating the resist pattern in a hardbake process;
- (f) treating the hardbaked resist pattern with a material effective to make alkaline a surface of the resist pattern;
- (g) applying a second layer of a second photosensitive composition over the treated resist pattern and the one or more layers to be patterned, wherein the second photosensitive composition comprises a resin component and a photoacid generator;
- (h) exposing the second layer to activating radiation by flood exposure;
- and
- (i) developing the exposed second layer, leaving a portion of the second layer after development.
7 more elements
Dependencies are inferred from the claim text.