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US 8,507,176 B2Granted
Photosensitive compositions
AssigneeRohm and Haas Electronic Materials LLC
InventorsJames W. Thackeray, Emad Aqad
Life of this patent
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Abstract
Provided are radiation-sensitive polymers and compositions which may be used in photolithographic processes. The polymers and compositions provide enhanced sensitivity to activating radiation.
Claims11
A polymer comprising a polymer backbone and a monomeric photoacid generator covalently attached to the polymer backbone, wherein the monomeric photoacid generator is derived from one or more sulfonium salt or iodonium salt having a polymerizable sulfonate anion represented by formula (1a) or formula (1b), respectively:
- wherein:
- Y is hydrogen, alkyl, fluorinated alkyl or fluorine;
- R1, R2, R3, R4 and R5 are independently chosen from substituted and unsubstituted aryl;
- and Z is a substituted aromatic group covalently bonded to the sulfonate anion via a straight or branched perfluorinated-alkyl chain comprising a terminal CF2, C(F)(CF3) or C(CF3)2.
1 more element
Dependencies are inferred from the claim text.