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US 8,507,160 B2Granted
Flare prediction method, photomask manufacturing method, semiconductor device manufacturing method, and computer-readable medium
AssigneeKabushiki Kaisha Toshiba
InventorsTaiga Uno, Yukiyasu Arisawa
Life of this patent
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Abstract
According to one embodiment, a flare prediction method in photolithography includes determining a pattern density distribution of a pattern layout, determining an inclination of a variation in the pattern density distribution, and performing a flare calculation in a plurality of partition sizes based on the inclination of a variation in the pattern density distribution.
Claims11
A flare prediction method in photolithography comprising:
- determining a pattern density distribution of a pattern layout;
- determining an inclination of a variation in the pattern density distribution;
- and
- performing a flare calculation in a plurality of partition sizes based on the inclination of a variation in the pattern density distribution.
1 more element
A computer-readable medium configured to store program instructions to predict flare amount in photolithography, the program instructions causing a computer to perform:
- determining a pattern density distribution of a pattern layout;
- determining an inclination of a variation in the pattern density distribution;
- and
- performing a flare calculation in a plurality of partition sizes based on the inclination of a variation in the pattern density distribution.
1 more element
Dependencies are inferred from the claim text.