Electron beam data storage system and method for high volume manufacturing
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsHung-Chun Wang, Pei-Shiang Chen, Tzu-Chin Lin, Faruk Krecinic, Jeng-Horng Chen, Wen-Chun Huang, Ru-Gun Liu
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Abstract
The present disclosure provides for many different embodiments of a charged particle beam data storage system and method. In an example, a method includes dividing a design layout into a plurality of units; creating a lookup table that maps each of the plurality of units to its position within the design layout and a data set, wherein the lookup table associates any repeating units in the plurality of units to a same data set; and exposing an energy sensitive layer to a charged particle beam based on the lookup table.
Claims16
A method comprising:
- dividing a design layout into a plurality of units;
- creating a lookup table that maps each of the plurality of units to its position within the design layout and a data set, wherein the lookup table associates any repeating units in the plurality of units to a same data set;
- and
- exposing an energy sensitive layer to a charged particle beam based on the lookup table.
A method comprising:
- reducing a design layout having a data representation of a first data size, wherein the design layout includes a plurality of pattern portions, to a second data size, the second data size being less than the first data size, wherein any pattern portion that is repeated in the design layout is included once in the data representation of the second data size;
- creating a lookup table that maps each of the included plurality of pattern portions to at least one location within the design layout;
- and
- exposing an energy sensitive layer to a charged particle beam based on the lookup table.
Dependencies are inferred from the claim text.