Pellicle frame and pellicle containing same
AssigneeMitsui Chemicals, Inc.
InventorsShuichi Murakami, Takashi Kozeki
Life of this patent
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Abstract
Provided is a pellicle that has appropriate membrane strength, high resistance to chemicals, and a low degree of sulfate ion generation and outgassing. A provided pellicle frame supports the outer rim of a pellicle membrane, and an epoxy resin coating is formed on the surface of the pellicle frame. In the infrared absorption spectrum of said epoxy resin coating, the ratio of the absorbance of a peak in the range between 1450 cm−1 and 1550 cm−1 to the absorbance of a peak in the range between 1200 cm−1 and 1275 cm−1 is at least 0.5 and at most 3; also, the ratio of the absorbance of a peak in the range between 1450 cm−1 and 1550 cm−1 to the absorbance of a peak in the range between 905 cm−1 and 930 cm−1 is at least 1 and less than 7.
Claims10
A pellicle frame for supporting a periphery of a pellicle membrane, comprising:
- an epoxy resin coating formed on a surface of the pellicle frame,
- wherein, in an infrared absorption spectrum of the epoxy resin coating, a ratio of an absorbance of peak B in a range between 1450 cm−1 and 1550 cm−1 to an absorbance of peak A in a range between 1200 cm−1 and 1275 cm−1 is 0.5 to 3, and a ratio of an absorbance of a peak B in a range between 1450 cm−1 and 1550 cm−1 to an absorbance of a peak C in a range between 905 cm−1 and 930 cm−1 is 1 to less than 7.
Dependencies are inferred from the claim text.