Semiconductor hollow-core waveguide using photonic crystal gratings
AssigneeThe United States of America as represented by the Secretary of the Army
InventorWeimin Zhou
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AssigneeThe United States of America as represented by the Secretary of the Army
InventorWeimin Zhou
Estimating the term…
A semiconductor hollow-core waveguide using high-contrast gratings or photonic crystal claddings and a method of manufacturing the same includes providing a layered semiconductor structure; creating an etching mask pattern over the layered semiconductor structure; performing a combined cycled directional etching process on the layered semiconductor structure in one sequence and in one lithography level to create a 3-dimensional waveguide structure; and creating a hollow air core in the layered semiconductor structure by removing to define a shape of the waveguide. The etching process comprises vertically etching a series of deep trenches on the layered semiconductor structure with precise control and varying the width of the trench. Furthermore, the hollow air core is created by removing a portion of the sacrificial material located in the center of the waveguide and under the waveguide.
A method of manufacturing a semiconductor hollow-core waveguide using any of high-contrast gratings and photonic crystal cladding, said method comprising:
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