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US 8,506,710 B2Granted
Apparatus for fabricating semiconductor device
AssigneeLG Display Co., Ltd.
InventorJung-Woo Hwang
Life of this patent
Estimating the term…
Abstract
An apparatus for fabricating a semiconductor device includes: a chamber having a sidewall; a susceptor in the chamber; a plurality of injection holes in the sidewall, the plurality of injection holes disposed along a horizontal direction; and a plurality of exhaust holes in the sidewall, the plurality of exhaust holes disposed along the horizontal direction and facing the plurality of injection holes with the susceptor therebetween.
Claims15
An apparatus for fabricating a semiconductor device comprising:
- a chamber having a sidewall;
- a susceptor in the chamber;
- a plurality of injection holes in the sidewall, the plurality of injection holes disposed along a horizontal direction and arranged in a single row, each of the plurality of injection holes in direct communication with the chamber;
- a plurality of exhaust holes in the sidewall, the plurality of exhaust holes disposed along the horizontal direction and facing the plurality of injection holes with the susceptor therebetween, wherein the plurality of exhaust holes are arranged in a single row;
- one first buffer cavity having a bent portion, one end of the one first buffer cavity connected to the plurality of injection holes;
- one inlet pipe connected to the other end of the one first buffer cavity;
- a second buffer cavity having a U-shape, one end of the second buffer cavity connected to the plurality of exhaust holes;
- and
- an outlet pipe connected to the other end of the second buffer cavity,
- wherein the one first buffer cavity has the bent portion therein to diffuse reaction gases in the one first buffer cavity and to change a flow path of the reaction gases,
- wherein the second buffer cavity has the U-shape therein to concentrate the reaction gases in the second buffer cavity and to change the flow path of the reaction gases.
8 more elements
An apparatus for fabricating a semiconductor device comprising:
- a chamber having a plurality of injection holes and a plurality of exhaust holes for transport of reaction gases through the chamber in a flow direction from the plurality of injection holes toward the plurality of exhaust holes, wherein the plurality of injection holes are arranged in a first single row and the plurality of exhaust holes are arranged in a second single row, each of the plurality of injection holes in direct communication with the chamber;
- a gas supply apparatus and a gas exhaust apparatus coupled to the chamber;
- a first structure in communication with the plurality of injection holes and the gas supply apparatus and a second structure in communication with the plurality of exhaust holes and the gas exhaust apparatus, the first structure including one first buffer cavity having a bent portion, one end of the one first buffer cavity connected to the plurality of injection holes, the second structure including a second buffer cavity having a U-shape, one end of the second buffer cavity connected to the plurality of exhaust holes;
- one inlet pipe connected to the other end of the one first buffer cavity;
- and
- an outlet pipe connected to the other end of the second buffer cavity,
- wherein the first and second structure change a flow of reaction gas with respect to the flow direction, the one first buffer cavity has the bent portion therein to diffuse the reaction gases in the one first buffer cavity and to change the flow path of the reaction gases, and the second buffer cavity has the U-shape therein to concentrate the reaction gases in the second buffer cavity and to change a flow path of the reaction gases.
4 more elements
Dependencies are inferred from the claim text.