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US 8,505,559 B2Granted
Cleaning apparatus and high pressure cleaner for use therein
AssigneeIndustry-University Cooperation Foundation Sogang University
InventorsGap Su Han, Ki Pung Yoo, Jong Sung Lim, Young Hoon Kwon
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Abstract
A cleaning apparatus in which a cleaning process is simplified, a time required for the cleaning process is reduced and which has an excellent cleaning effect, and a high pressure cleaner for use therein are provided.
Claims9
A cleaning apparatus comprising:
- a liquid carbon dioxide (CO2) supply source and a gaseous CO2 supply source;
- a high pressure pump changing CO2 supplied from the liquid CO2 supply source to CO2 having high pressure;
- a cleaning additive supply source and a rinsing additive supply source;
- a homogeneous transparent phase mixer forming a supercritical homogeneous transparent phase mixture by mixing a cleaning additive supplied from the cleaning additive supply source and supercritical CO2 supplied from the liquid CO2 supply source, or forming a supercritical rinsing mixture by mixing a rinsing additive supplied from the rinsing additive supply source and supercritical CO2 supplied from the liquid CO2 supply source;
- a high pressure cleaner cleaning using the supercritical homogeneous transparent phase mixture supplied from the homogeneous transparent phase mixer and performing rinsing using the supercritical rinsing mixture supplied from the homogeneous transparent phase mixer;
- a separator separating gaseous CO2 from a mixture discharged from the high pressure cleaner;
- and
- a CO2 condenser condensing the separated CO2;
- wherein the homogeneous transparent phase mixer comprises a high pressure vessel, the vessel being separate from the cleaning additive supply source, the rinsing additive supply source, and the high pressure cleaner.
6 more elements
Dependencies are inferred from the claim text.