Method for manufacturing lower mold, method for manufacturing glass gob, and method for manufacturing molded glass article
AssigneeKonica Minolta Opto, Inc.
InventorsShunichi Hayamizu, Naoyuki Fukumoto
Life of this patent
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Abstract
In one aspect, there is provided a process for manufacturing a lower mold for receiving a falling molten glass droplet, in which without narrowing the option for material for a lower mold, any occurrence of air retention can be favorably prevented and a lower mold excelling in durability can be obtained. The process comprises the film forming step of forming a coating layer on a base material and the surface roughening step of roughening the surface of the coating layer. Preferably, the coating layer contains at least one element selected from among chromium, aluminum and titanium.
Claims12
A method for manufacturing a lower mold for receiving a dropping molten glass droplet, the method comprising:
- depositing a coating layer on a substrate by a sputtering method, the coating layer comprising a lower layer and a surface layer, wherein the coating layer comprises chromium, and wherein the depositing comprises:
- sputtering a target comprising chromium under first layer forming conditions to deposit the lower layer on the substrate;
- and
- sputtering the target to deposit the surface layer on the lower layer under second layer forming conditions under which energy of sputtered particles arriving at a surface under deposition is lower than under the first layer forming conditions, so that an etching rate of the surface layer is larger than an etching rate of the lower layer;
- and
- roughening a surface of the coating layer by etching to make a roughened surface.
A method for manufacturing a lower mold for receiving a dropping molten glass droplet, the method comprising:
- depositing a coating layer on a substrate by a sputtering method, the coating layer comprising a lower layer and a surface layer, wherein the depositing comprises:
- sputtering a target comprising chromium under first layer forming conditions to deposit the lower layer on the substrate;
- and
- sputtering the target to deposit the surface layer on the lower layer under second layer forming conditions under which energy of sputtered particles arriving at a surface under deposition is lower than under the first layer forming conditions, so that an etching rate of the surface layer is larger than an etching rate of the lower layer;
- and
- roughening a surface of the coating layer to make a roughened surface, wherein the roughened surface of the coating layer has an arithmetic average roughness Ra of 0.01 μm or more and an average length of roughness curve element RSm of 0.5 μm or less.
A method for manufacturing a glass gob, the method comprising:
- dropping a molten glass droplet on a lower mold;
- and
- cooling and solidifying the dropped molten glass droplet on the lower mold, wherein the lower mold is manufactured by the method comprising:
- depositing a coating layer on a substrate by a sputtering method, the coating layer comprising a lower layer and a surface layer, wherein the coating layer comprises chromium, and wherein the depositing comprises:
- sputtering a target comprising chromium under first layer forming conditions to deposit the lower layer on the substrate;
- and
- sputtering the target to deposit the surface layer on the lower layer under second layer forming conditions under which energy of sputtered particles arriving at a surface under deposition is lower than under the first layer forming conditions, so that an etching rate of the surface layer is larger than an etching rate of the lower layer;
- and
- roughening a surface of the coating layer by etching to make a roughened surface.
A method for manufacturing a molded glass article, the method comprising:
- dropping a molten glass droplet on a lower mold;
- and
- press-molding the dropped molten glass droplet by using the lower mold and an upper mold facing the lower mold, wherein the lower mold is manufactured by the method comprising:
- depositing a coating layer on a substrate by a sputtering method, the coating layer comprising a lower layer and a surface layer, wherein the coating layer comprises chromium, wherein the depositing comprises:
- sputtering a target comprising chromium under first layer forming conditions to deposit the lower layer on the substrate;
- and
- sputtering the target to deposit the surface layer on the lower layer under second layer forming conditions under which energy of sputtered particles arriving at a surface under deposition is lower than under the first layer forming conditions, so that an etching rate of the surface layer is larger than an etching rate of the lower layer;
- and
- roughening a surface of the coating layer by etching to make a roughened surface.
Dependencies are inferred from the claim text.