Method and system for mask handling in high productivity chamber
AssigneeIntermolecular, Inc.
InventorsRick Endo, James Tsung, Kurt H Weiner
Life of this patent
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Abstract
A structure for independently supporting a wafer and a mask in a processing chamber is provided. The structure includes a set of extensions for supporting the wafer and a set of extensions supporting the mask. The set of extensions for the wafer and the set of extensions for the mask enable independent movement of the wafer and the mask. In one embodiment, the extensions are affixed to an annular ring which is capable of moving in a vertical direction within the processing chamber. A processing chamber, a mask, and a method for combinatorially processing a substrate are also provided.
Claims10
A combinatorial processing system, comprising:
- a structure for independently supporting a substrate and a mask in a processing chamber, the structure comprising:
- a first set of extensions for supporting the substrate;
- a second set of extensions supporting the mask;
- wherein the first and second sets of extensions enable independent movement of the substrate and the mask;
- wherein the second set of extensions enable the mask to be rotated and re-positioned within the processing chamber;
- and
- an orienter module having an orienter therein, the orienter operable to rotate the mask such that a plurality of deposition areas can be defined with the mask.
Dependencies are inferred from the claim text.