Manufacturing of hard masks for patterning magnetic media

Abstract

Embodiments of the present invention relate to systems and methods for designing and manufacturing hard masks used in the creation of patterned magnetic media and, more particularly, patterned magnetic recording media used in hard disk drives (e.g., bit patterned media (BPM)). In some embodiments, the hard mask incorporates at least one layer of Ta (tantalum) and at least one layer of C (carbon) and is used during ion implantation of a pattern onto magnetic media. The hard mask can be fabricated with a high aspect ratio to achieve small feature sizes while maintaining its effectiveness as a mask, is robust enough to withstand the ion implantation process, and can be removed after the ion implantation process with minimal damage to the magnetic media.

Dependencies are inferred from the claim text.