Antireflective coating composition and process thereof
AssigneeAZ Electronic Materials USA Corp.
InventorsM. Dalil Rahman, Douglas McKenzie, Huirong Yao, JoonYeon Cho, Yi Yl, Guanyang Lin
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Abstract
The invention relates to an antireflective coating composition comprising a crosslinker and a crosslinkable polymer capable of being crosslinked by the crosslinker, where the crosslinkable polymer comprises a unit represented by structure (1): A-Bn (1) where A is a fused aromatic ring and B has a structure (2), where R1 is C1-C4alkyl and R2 is C1-C4alkyl. The invention further relates to a process for forming an image using the composition.
Claims17
An antireflective coating composition comprising a crosslinker and a crosslinkable polymer capable of being crosslinked by the crosslinker, where the crosslinkable polymer comprises a unit represented by structure (1):
- A-B (1)
- where A is a fused aromatic ring comprising 3 to 5 fused aromatic rings and which further is unsubstituted or substituted with one or more organo constituents selected from the group consisting of alkyl, substituted alkyl, aryl, substituted aryl, alkylaryl, haloalkyls, hydroxyl, amino, aminoalkyl, and alkoxy, and B has a structure (2),
- where R1 is C1-C4alkyl and R2 is C1-C4alkyl, and where the composition further comprises an acid generator.
A process for manufacturing a microelectronic device, comprising:
- a) providing a substrate with a first layer of an antireflective coating composition comprising a crosslinker and a crosslinkable polymer capable of being crosslinked by the crosslinker, where the crosslinkable polymer comprises a unit represented by structure (1):
- A-B (1)
- where A is a fused aromatic ring comprising 3 to 5 fused aromatic rings and which further is unsubstituted or substituted with one or more organo constituents selected from the group consisting of alkyl, substituted alkyl, aryl, substituted aryl, alkylaryl, haloalkyls, hydroxyl, amino, aminoalkyl, and alkoxy, and B has a structure (2),
- where R1 is C1-C4alkyl and R2 is C1-C4alkyl,
- b) optionally, providing at least a second antireflective coating layer over the first antireflective coating composition layer;
- c) coating a photoresist layer above the antireflective coating layers;
- d) imagewise exposing the photoresist layer with radiation in the deep and extreme ultraviolet (uv) region;
- e) developing the photoresist layer with an aqueous alkaline developing solution.
Dependencies are inferred from the claim text.