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AssigneeHitachi High-Technologies Corporation
InventorsKei Sakai, Fumihiro Sasajima
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Provided is a method for determining the magnification of a pattern searching template of a scanning electron microscope. The determining method comprises: acquiring a first image initially at a first magnification; then acquiring a second image which contains a pattern image displayed on the first image at a second magnification lower than the first magnification; making the size of the first image coincident with the size of a third image which cut out a portion of the second image; thereafter determining the correlation value between the first image and the third image; and setting the second magnification as the magnification of a pattern searching template, in the case where the correlation value is equal to or higher than a predetermined value. As a result, a condition for acquiring a search area can be properly set, when pattern recognition is performed by means of the template.
A method for setting pattern-searching condition for specifying a desired pattern on a sample, comprising the steps of:
A device for setting pattern-searching condition connected to a scanning electron microscope, for setting a pattern searching condition in the scanning electron microscope, the setting device is provided with a calculation device, wherein the calculation device acquires a first image obtained by scanning charged particle beam at a first magnification, and acquires at a second magnification lower than the first magnification a second image which contains a pattern image displayed on the first image, makes a size of the first image coincident with a size of a third image which cut out a portion of the second image, and sets the second magnification as a magnification in acquiring an image to be searched in the pattern searching in the case where a correlation value between the both is equal to or higher than a predetermined value.
Dependencies are inferred from the claim text.