Refractive index distribution measuring method and apparatus, and method of producing optical element thereof, that use multiple transmission wavefronts of a test object immersed in at least one medium having a different refractive index from that of the test object and multiple reference transmission wavefronts of a reference object having known shape and refractive index distribution

A refractive index distribution measuring apparatus configured to measure a refractive index distribution of an object using a first medium having a first refractive index and a second medium having a second refractive index, the first and second refractive indices being different from each other and from that of the object, the apparatus comprising:

• a transmitted wavefront measuring part, comprising a light source, a pinhole, and image pickup element, and an object case, configured to cause a reference light to enter the object placed in the first medium to measure a first transmitted wavefront of the object, and configured to cause the reference light to enter the object placed in the second medium to measure a second transmitted wavefront of the object;
• a reference transmitted wavefront calculating part configured to calculate a first reference transmitted wavefront of a reference object acquirable when causing the reference light to enter the reference object placed in the first medium, the reference object having a known shape and a known refractive index distribution, and configured to calculate a second reference transmitted wavefront of the reference object acquirable when causing the reference light to enter the reference object placed in the second medium;
• a refractive index distribution calculating part configured to calculate the refractive index distribution from which a shape component of the object is removed, using the first and second transmitted wavefronts and the first and second reference transmitted wavefronts,
• wherein the transmitted wavefront measuring part is configured to measure the first transmitted wavefront by causing the reference light to enter the object placed in plural placement states in the first medium, and measure the second transmitted wavefront by causing the reference light to enter the object placed in the plural placement states in the second medium;
• and
• an alignment error calculating part configured to calculate an aberration sensitivity with respect to changes of the placement state of the object, and configured to calculate an alignment error of the object in each of the plural placement states in the measurements of the first and second transmitted wavefronts, using the aberration sensitivity and the first and second transmitted wavefronts measured in the plural placement states,
• wherein the reference transmitted wavefront calculating part is configured to calculate the first and second reference transmitted wavefronts respectively acquirable when causing the reference light to enter the reference object placed in placement states including the alignment errors in the first medium and the second medium.

A method of producing an optical element, the method comprising the steps of:

• performing mold forming of the optical element;
• and
• measuring a refractive index distribution of the optical element, which is an object, using a refractive index distribution measuring method;
• evaluating the optical element using the measured refractive index distribution,
• wherein the refractive index distribution measuring method measures the refractive index distribution of the object using a first medium having a first refractive index and a second medium having a second refractive index, the first and second refractive indices being different from each other and from a refractive index of the object, and
• wherein the refractive index distribution measuring method comprises:
• a transmitted wavefront measuring step of causing a reference light to enter the object placed in the first medium to measure a first transmitted wavefront of the object, and of causing the reference light to enter the object placed in the second medium to measure a second transmitted wavefront of the object;
• a reference transmitted wavefront calculating step of calculating a first reference transmitted wavefront of a reference object acquirable when causing the reference light to enter the reference object placed in the first medium, the reference object having a known shape and a known refractive index distribution, and of calculating a second reference transmitted wavefront of the reference object acquirable when causing the reference light to enter the reference object placed in the second medium;
• and
• a refractive index distribution calculating step of calculating the refractive index distribution from which a shape component of the object is removed, using the first and second transmitted wavefronts and the first and second reference transmitted wavefronts,
• wherein the transmitted wavefront measuring step measures the first transmitted wavefronts by causing the reference light to enter the object placed in plural placement states in the first medium, and measures the second transmitted wavefronts by causing the reference light to enter the object placed in the plural placement states in the second medium;
• and
• wherein the method further comprises an alignment error calculating step of calculating an aberration sensitivity with respect to changes of the placement state of the object, and of calculating an alignment error of the object in each of the plural placement states in the measurements of the first and second transmitted wavefronts, using the aberration sensitivity and the first and second transmitted wavefronts measured in the plural placement states, and
• wherein the reference transmitted wavefront calculating step calculates the first and second reference transmitted wavefronts respectively acquirable when causing the reference light to enter the reference object placed in placement states including the alignment errors in the first medium and the second medium.

A refractive index distribution measuring method of measuring a refractive index distribution of an object using a medium having a refractive index different from that of the object, and using a first reference light and a second reference light having a wavelength different from that of the first reference light, the method comprising:

• a transmitted wavefront measuring step of causing the first reference light to enter the object placed in the medium to measure a first transmitted wavefront of the object, and of causing the second reference light to enter the object placed in the medium to measure a second transmitted wavefront of the object;
• a reference transmitted wavefront calculating step of calculating a first reference transmitted wavefront of a reference object acquirable when causing the first reference light to enter the reference object placed in the medium, the reference object having a known shape and a known refractive index distribution, and of calculating a second reference transmitted wavefront of the reference object acquirable when causing the second reference light to enter the reference object placed in the medium;
• a refractive index distribution calculating step of calculating the refractive index distribution from which a shape component of the object is removed, using the first and second transmitted wavefronts and the first and second reference transmitted wavefronts,
• wherein the transmitted wavefront measuring step measures the first transmitted wavefront by causing the first reference light to enter the object placed in plural placement states in the medium, and measures the second transmitted wavefront by causing the second reference light to enter the object placed in the plural placement states;
• and
• an alignment error calculating step of calculating an aberration sensitivity with respect to changes of the placement state of the object, and of calculating an alignment error of the object in each of the plural placement states in the measurements of the first and second transmitted wavefronts, using the aberration sensitivity and the first and second transmitted wavefronts measured in the plural placement states,
• wherein the reference transmitted wavefront calculating step calculates the first and second reference transmitted wavefronts respectively acquirable when causing the first reference light and the second reference light to enter the reference object placed in placement states including the alignment errors.

A refractive index distribution measuring apparatus configured to measure a refractive index distribution of an object using a medium having a refractive index different from that of the object, and using a first reference light and a second reference light having a wavelength different from that of the first reference light, the apparatus comprising:

• a transmitted wavefront measuring part, comprising a light source, a pinhole, and image pickup element, and an object case, configured to cause the first reference light to enter the object placed in the medium to measure a first transmitted wavefront of the object, and configured to cause the second reference light to enter the object placed in the medium to measure a second transmitted wavefront of the object;
• a reference transmitted wavefront calculating part configured to calculate a first reference transmitted wavefront of a reference object acquirable when causing the first reference light to enter the reference object placed in the medium, the reference object having a known shape and a known refractive index distribution, and configured to calculate a second reference transmitted wavefront of the reference object acquirable when causing the second reference light to enter the reference object placed in the medium;
• a refractive index distribution calculating part configured to calculate the refractive index distribution from which a shape component of the object is removed, using the first and second transmitted wavefronts and the first and second reference transmitted wavefronts,
• wherein the transmitted wavefront measuring part is configured to measure the first transmitted wavefront by causing the first reference light to enter the object placed in plural placement states in the medium, and configured to measure the second transmitted wavefront by causing the second reference light to enter the object placed in the plural placement states and
• an alignment error calculating part configured to calculate an aberration sensitivity with respect to changes of the placement state of the object, and configured to calculate an alignment error of the object in each of the plural placement states in the measurements of the first and second transmitted wavefronts, using the aberration sensitivity and the first and second transmitted wavefronts measured in the plural placement states,
• wherein the reference transmitted wavefront calculating part is configured to calculate the first and second reference transmitted wavefronts respectively acquirable when causing the first reference light and the second reference light to enter the reference object placed in placement states including the alignment errors.

A method of producing an optical element, the method comprising the steps of:

• performing mold forming of the optical element;
• and
• measuring a refractive index distribution of the optical element, which is an object, using a refractive index distribution measuring method;
• and
• evaluating the optical element using the measured refractive index distribution,
• wherein the refractive index distribution measuring method measures the refractive index distribution of the object using a medium having a refractive index different from that of the object, and using a first reference light and a second reference light having a wavelength different from that of the first reference light,
• wherein the refractive index distribution measuring method comprises:
• a transmitted wavefront measuring step of causing the first reference light to enter the object placed in the medium to measure a first transmitted wavefront of the object, and of causing the second reference light to enter the object placed in the medium to measure a second transmitted wavefront of the object;
• a reference transmitted wavefront calculating step of calculating a first reference transmitted wavefront of a reference object acquirable when causing the first reference light to enter the reference object placed in the medium, the reference object having a known shape and a known refractive index distribution, and of calculating a second reference transmitted wavefront of the reference object acquirable when causing the second reference light to enter the reference object placed in the medium;
• and
• a refractive index distribution calculating step of calculating the refractive index distribution from which a shape component of the object is removed, using the first and second transmitted wavefronts and the first and second reference transmitted wavefronts,
• wherein the transmitted wavefront measuring step measures the first transmitted wavefront by causing the first reference light to enter the object placed in plural placement states in the medium, and measures the second transmitted wavefront by causing the second reference light to enter the object placed in the plural placement states,
• wherein the method further comprises an alignment error calculating step of calculating an aberration sensitivity with respect to changes of the placement state of the object, and of calculating an alignment error of the object in each of the plural placement states in the measurements of the first and second transmitted wavefronts, using the aberration sensitivity and the first and second transmitted wavefronts measured in the plural placement states, and
• wherein the reference transmitted wavefront calculating step calculates the first and second reference transmitted wavefronts respectively acquirable when causing the first reference light and the second reference light to enter the reference object placed in placement states including the alignment errors.