Thin film transistor array substrate, method of manufacturing the same, and liquid crystal display device

A method of manufacturing a thin film transistor array substrate, comprising:

• forming a first metal layer on a transparent substrate and patterning the first metal layer so as to form gate electrodes of thin film transistors, scanning lines, main body portions of common electrode lines and first push alignment electrodes and second push alignment electrodes constituted by two extending portions of the common electrode lines;
• forming a transparent conductive material layer and patterning the transparent conductive material layer so as to form pixel electrodes;
• forming a gate electrode insulation layer and patterning the gate electrode insulation layer so as to form first portions of pull alignment openings on the gate electrode insulation layer covering the pixel electrodes so that portions of the pixel electrodes are exposed, and to form through holes in the pixel regions and through apertures in the non-display area;
• forming an amorphous silicon layer and a doped amorphous silicon layer sequentially, and patterning the amorphous silicon layer and the doped amorphous silicon layer so as to form semiconductor layers of the thin film transistors;
• forming a second metal layer and patterning the second metal layer so as to form source electrodes and drain electrodes of the thin film transistors and data lines, the drain electrode of the thin film transistor being electrically connected with the corresponding pixel electrode via the above through hole;
• and
• depositing a passivation layer and patterning the passivation layer so as to form second portions of the pull alignment openings at locations corresponding to the first portions of the pull alignment openings on the passivation layer covering the pixel electrodes so that portions of the pixel electrodes are exposed.