Active matrix organic electroluminescent device and method of manufacture thereof

A method of manufacturing an active matrix organic electroluminescent device, comprising the steps of:

• (1) preprocessing a substrate;
• (2) preparing a thin-film transistor on the substrate;
• (3) applying a spacer layer material onto a surface of the thin-film transistor forming a spacer layer, wherein the spacer layer material is made up of a dual curing system which is achieved by two independent curing stages, one is an ultraviolet curing reaction, the other is a dark reaction, wherein the dual curing system is a curing system selected from the group consisting of an ultraviolet curing-thermal curing system, an ultraviolet curing-microwave curing system, an ultraviolet curing-anaerobic curing system and an ultraviolet curing-electron beam curing system;
• (4) curing the spacer layer by ultraviolet irradiation;
• (5) anaerobic-curing or electron beam-curing the spacer layer under the vacuum condition;
• (6) photoetching the spacer layer forming a pattern thereon;
• (7) preparing an organic electroluminescent device on the spacer layer;
• (8) curing the spacer layer by ultraviolet irradiation again;
• (9) packaging the active matrix organic electroluminescent device;
• and
• (10) testing every photoelectric property and intrinsic parameter of the active matrix organic electroluminescent device,
• wherein steps (4) and (5) can be exchanged, that is to say, firstly anaerobic curing or electron beam curing, and then ultraviolet curing.

A method of manufacturing an active matrix organic electroluminescent device, comprising the steps of:

• (1) ultrasonically cleaning a substrate by detergent, acetone solution, ethanol solution and deionized water, and drying the substrate by blowing dry nitrogen thereto;
• (2) preparing a thin-film transistor on the processed substrate;
• (3) stirring a spacer layer material diluted by ethanol for 20 hours forming a mixture, wherein the spacer layer material:
• ethanol is 1:10, applying the mixture onto a surface of the thin-film transistor in a spinning manner for a minute forming a spacer layer, wherein the spinning rate is 2000˜3000 rev/sec and a thickness of the spacer layer is 100 nm,
• wherein the adhesive material comprises:
• 30˜40% acrylic resin;
• 35˜45% isocyanate;
• 0.2˜3% polyfunctional acrylic;
• 0.1˜3% photoinitiator;
• and
• 0.2˜6% photosensitizer and additive;
• (4) ultraviolet-curing a surface of the spacer layer for 30 sec;
• (5) thermal-curing or microwave-curing or anaerobic-curing or electron beam-curing the spacer layer;
• (6) photoetching the spacer layer forming an pattern thereon;
• (7) preparing an organic electroluminescent device on the spacer layer;
• (8) ultraviolet-curing the active matrix organic electroluminescent device for 60 sec after the step (7);
• and
• (9) testing every photoelectric property and parameter of the active matrix organic electroluminescent device,
• wherein while using the ultraviolet curing-thermal curing or ultraviolet curing-microwave curing system, the step is firstly heat or microwave curing, then ultraviolet curing, and lastly heat or microwave curing;
• or firstly ultraviolet curing, then heat or microwave curing, and lastly ultraviolet curing.