Three-dimensional semiconductor device structures and methods
AssigneeFairchild Semiconductor Corporation
InventorQi Wang
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AssigneeFairchild Semiconductor Corporation
InventorQi Wang
Estimating the term…
A three-dimensional semiconductor device includes a first semiconductor device, a second semiconductor device, and a patterned conductive layer disposed between the first and the second semiconductor devices. The first semiconductor device has a first plurality of terminals on a front side of the first semiconductor device and a first metal substrate on its back side, wherein one of the first plurality of terminals in the first semiconductor device is electrically coupled to the first metal substrate. The second semiconductor device has a second plurality of terminals on a front side of the second semiconductor device and a second metal substrate on its back side, wherein the second semiconductor device further includes a second metal substrate on its back side. The patterned conductive layer includes a plurality of conductive regions. Each of the conductive regions is bonded to a conductor coupled to one of the first plurality of terminals and another conductor coupled to one of the second plurality of terminals.
A method for forming a three-dimensional semiconductor device, comprising:
A three-dimensional semiconductor device, comprising:
Dependencies are inferred from the claim text.