Plasma CVD apparatus

A plasma CVD apparatus comprising:

• a reaction chamber;
• and
• a first electrode and a second electrode facing each other in the reaction chamber, wherein a substrate is configured to be placed over the second electrode,
• wherein the first electrode comprises:
• a plurality of projected portions for forming glow discharge plasma in the reaction chamber;
• and
• a plurality of gas supply ports provided on apexes of the plurality of projected portions, and
• wherein the plurality of projected portions has a tapered shape and is chamfered.

A plasma CVD apparatus comprising:

• a reaction chamber;
• and
• an upper electrode and a lower electrode facing each other in the reaction chamber, wherein a substrate is configured to be placed over the lower electrode,
• wherein the upper electrode comprises:
• a plurality of projected portions for forming glow discharge plasma in the reaction chamber;
• a plurality of first gas supply ports provided on apexes of the plurality of projected portions;
• and
• a plurality of second gas supply ports provided around each of the plurality of projected portions, and
• wherein the plurality of projected portions has a tapered shape and is chamfered.

A plasma CVD apparatus comprising:

• a reaction chamber;
• and
• a first electrode and a second electrode facing each other in the reaction chamber, wherein a substrate is configured to be placed over the second electrode,
• wherein the first electrode comprises:
• projected portions for forming glow discharge plasma in the reaction chamber;
• and
• gas supply ports,
• wherein the projected portions and the gas supply ports are arranged alternately, and
• wherein the projected portions have a tapered shape and are chamfered.

A plasma CVD apparatus comprising:

• a reaction chamber;
• and
• a first electrode and a second electrode facing each other in the reaction chamber, wherein a substrate is configured to be placed over the second electrode,
• wherein the first electrode comprises:
• a plurality of projected portions for forming glow discharge plasma in the reaction chamber;
• and
• a plurality of gas supply ports provided around each of the plurality of projected portions.

A plasma CVD apparatus comprising:

• a reaction chamber;
• and
• a first electrode and a second electrode facing each other in the reaction chamber, wherein a substrate is configured to be placed over the second electrode,
• wherein the first electrode comprises:
• a plurality of projected portions for forming glow discharge plasma in the reaction chamber;
• and
• a plurality of gas supply ports provided on apexes of the plurality of projected portions.

A plasma CVD apparatus comprising:

• a reaction chamber;
• and
• an upper electrode and a lower electrode facing each other in the reaction chamber, wherein a substrate is configured to be placed over the lower electrode,
• wherein the upper electrode comprises:
• a plurality of projected portions for forming glow discharge plasma in the reaction chamber;
• a plurality of first gas supply ports provided on apexes of the plurality of projected portions;
• and
• a plurality of second gas supply ports provided around each of the plurality of projected portions.