Compound, method for preparing the compound and resist composition containing the compound
AssigneeSumitomo Chemical Company, Limited
InventorsIchiki Takemoto, Nobuo Ando, Mitsuhiro Hata
Life of this patent
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Abstract
A compounds represented by the Formula (I) or the Formula (I′). wherein Z1 and Z2 independently represent a hydrogen atom, a C1 to C12 alkyl group or a C3 to C12 cyclic saturated hydrocarbon group, provided that at least one of Z1 and Z2 represent a C1 to C12 alkyl group or a C3 to C12 cyclic saturated hydrocarbon group; rings Y1 and Y2 independently represents an optionally substituted C3 to C20 alicyclic hydrocarbon group; Q1 to Q4 and Q′1 to Q′4 independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group; and m and n independently represent an integer of 0 to 5.
Claims3
A compounds represented by the Formula (I) or the Formula (I′),
- wherein Z1 and Z2 independently represent a hydrogen atom, a C1 to C12 alkyl group or a C3 to C12 cyclic saturated hydrocarbon group, provided that at least one of Z1 and Z2 represent a C1 to C12 alkyl group or a C3 to C12 cyclic saturated hydrocarbon group;
- rings Y1 and Y2 independently represents an optionally substituted C3 to C20 alicyclic hydrocarbon group;
- and Q1 to Q4 independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group;
- wherein Q′1 to Q′4 independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group;
- and m and n independently represent an integer of 0 to 5.
Dependencies are inferred from the claim text.