Base generator
AssigneeDai Nippon Printing Co., Ltd.
InventorsMami Katayama, Shunji Fukuda, Katsuya Sakayori
Life of this patent
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Abstract
A photosensitive resin composition which is excellent in resolution, low in cost, and usable in a wide range of structures of polymer precursors each of which is reacted into a final product by a basic substance or by heating in the presence of a basic substance. The photosensitive resin composition includes a base generator which has a specific structure and generates a base by exposure to electromagnetic radiation and heating, and a polymer precursor which is reacted into a final product by the base generator and by a basic substance or by heating in the presence of a basic substance.
Claims5
A base generator which is represented by the following chemical formula (1) and generates a base by exposure to electromagnetic radiation and heating:
- wherein R1 and R2 are a combination of hydrogen and a saturated or unsaturated cycloalkyl group or independently a monovalent organic group, and R1 and R2 may be bound to form a cyclic structure which may contain a heteroatom;
- R3, R4, R5 and R6 are independently hydrogen, halogen, a hydroxyl group, a nitro group, a nitroso group, a mercapto group, a silyl group, a silanol group or a monovalent organic group and may be the same or different;
- two or more of R3, R4, R5 and R6 may be bound to form a cyclic structure which may contain a heteroatom;
- at least one of R3, R4, R5 and R6 is halogen, a hydroxyl group, a nitro group, a nitroso group, a mercapto group, a silyl group, a silanol group or a monovalent organic group, or two or more of R3, R4, R5 and R6 are bound to form a condensed ring together with a benzene ring to which R3, R4, R5 and R6 are bound.
Dependencies are inferred from the claim text.