Compound and photoresist composition containing the same

A photoresist composition comprising a resin,

• an acid generator and
• a compound represented by the formula (C1):
• wherein Rc2 represents a C6-C10 aromatic hydrocarbon group having at least one nitro group and the aromatic hydrocarbon group can have one or more substituents other than a nitro group, and Rc1 group represented by the formula (1):
• wherein Rc4 represents a hydrogen atom, or a linear, branched chain or cyclic C1-C6 aliphatic hydrocarbon group, Rc5 represents a C1-C30 divalent hydrocarbon which can have one or more substituents selected from the group consisting of a halogen atom, a hydroxyl group a mercapto group(—SH), an amino group and a carbamoyl group (—CONH2), and one or more —CH2— in the divalent hydrocarbon group can be replaced by —O—, —CO—, —S— or —NRc15— in which Rc15 represents a hydrogen atom or a linear or branched chain C1-C4 alkyl group, and one or more —CH═ in the divalent hydrocarbon group can be replaced by —N═, Rc4 and Rc5 and can be bonded each other to form a ring, together with the nitrogen atom to which Rc4 and Rc5 are bonded, and Rc3 represents a group represented by the formula (3-1), (3-2), (3-3):
• wherein Rc6, Rc7, Rc8, Rc9, Rc10, Rc11, Rc12, R13 and Rc14 each independently represent a C1-C30 hydrocarbon group which can have one or more hydroxyl groups, and one or more —CH2— in the C1-C30 hydrocarbon group can be replaced —O—, —CO—, —S— or —NRc16— in which Rc16 represents a hydrogen atom or a linear or branched chain C1-C4 alkyl group and Rc6and Rc7 can be bonded each other to form a ring together with the carbon atom to which Rc6 and Rc7 are bonded, and R9 and Rc10 can be bonded each other to form a ring together with the carbon atom to which Rc9 is bonded and the oxygen atom to which Rc10 is bonded.