Resist composition for immersion exposure, method of forming resist pattern, and fluorine-containing polymeric compound

A resist composition for immersion exposure comprising:

• a fluorine-containing polymeric compound (F) comprising a structural unit (f1) having at least one base dissociable group selected from those represented by general formulas (II-1) to (II-4) shown below and a structural unit (f2) represented by general formula (f2-1) shown below;
• a base component (A) that exhibits changed solubility in an alkali developing solution under the action of acid;
• and
• an acid generator component (B) that generates acid upon exposure:
• wherein each R2 independently represents a group represented by general formula (III-1) or (III-2) shown below:
• wherein R41′ represents an unsubstituted alkylene group of 1 to 9 carbon atoms, and R42′ represents a fluorinated alkyl group of 1 to 9 carbon atoms, with the provision that the total number of carbon atoms of R41′ and R42′ is no more than 10;
• each of R71 to R73 independently represents a linear alkyl group of 1 to 5 carbon atoms, with the provision that at least one of R71 to R73 represents an alkyl group having a fluorine atom;
• wherein R represents a hydrogen atom, a lower alkyl group or a halogenated lower alkyl group;
• and W is a group represented by any one of general formulas (w-1) to (w-4),
• wherein R21 represents an alkyl group of 2 or more carbon atoms;
• R22 and R23 are bonded to each other to form an aliphatic monocyclic group of 7 or more carbon atoms;
• R24 represents a branched alkyl group of 3 or more carbon atoms;
• R25 and R26 are bonded to each other to form an aliphatic cyclic group;
• R27 represents an acid dissociable, dissolution inhibiting group;
• R28 represents a divalent linking group containing a hetero atom;
• R29 represents a linear or branched alkyl group or an aliphatic cyclic group;
• n represents an integer of 0 to 3;
• R30 and R30′ each independently represent a linear or branched alkyl group or a hydrogen atom;
• and R29 and R30 may be bonded to each other to form an aliphatic cyclic group.