Method of patterning photosensitive material on a substrate containing a latent acid generator
AssigneeInternational Business Machines Corporation
InventorsMaxime Darnon, Pratik P. Joshi, Qinghuang Lin
Life of this patent
Estimating the term…
Abstract
The present disclosure relates to a method of patterning a photosensitive material on a polymeric fill matrix comprising at least one latent photoacid generator; and a structure prepared according to said method. The method comprises: a. depositing a polymeric fill matrix comprising at least one latent photoacid generator; b. curing the polymeric fill matrix; c. depositing a layer of photosensitive material directly onto the cured polymeric fill matrix; and d. forming a pattern with at least one opening in the layer of photosensitive material with lithography.
Claims20
A method of patterning a photosensitive material on a polymeric fill matrix comprising at least one latent photoacid generator comprising:
- embedding a polymeric fill matrix comprising at least one latent photoacid generator around carbon nanotubes grown upon a conductive substrate;
- curing the polymeric fill matrix;
- depositing a layer of photosensitive material directly onto the cured polymeric fill matrix;
- and
- forming a pattern with at least one opening in the layer of photosensitive material with lithography.
A method of patterning a photosensitive material on a polymeric fill matrix comprising at least one latent photoacid generator comprising:
- embedding a polymeric fill matrix comprising at least one latent photoacid generator around carbon nanotubes grown upon a conductive substrate;
- selectively etching back the polymer fill matrix to expose tips of the carbon nanotubes;
- curing the polymeric fill matrix;
- depositing a layer of photosensitive dielelectric material directly onto the cured polymeric fill matrix;
- and
- forming a pattern with at least one opening in the layer of photosensitive material with lithography.
Dependencies are inferred from the claim text.