Carrier head membrane
AssigneeApplied Materials, Inc.
InventorsYoung J. Paik, Ashish Bhatnagar, Kadthala Ramaya Narendrnath
Life of this patent
Estimating the term…
Abstract
A flexible membrane includes a horizontal central portion, a vertical portion coupled to the central portion, a thick rim portion coupled to the vertical portion, and an extension coupled to the thick rim portion. An outer surface of the horizontal central portion provides a mounting surface configured to receive a substrate. The thick rim portion has a thickness that is greater than a portion directly adjacent to the thick rim portion. The thick rim portion is between the extension and the vertical portion and a greatest dimension of the extension is less than the thickness of the thick rim portion.
Claims16
An article for use in a carrier head, comprising:
- a flexible membrane including a horizontal central portion, a vertical portion coupled to the central portion, a thick rim portion coupled to the vertical portion, and an extension coupled to the thick rim portion, an outer surface of the horizontal central portion providing a mounting surface configured to receive a substrate, the thick rim portion having a thickness that is greater than a portion directly adjacent to the thick rim portion, wherein the thick rim portion is between the extension and the vertical portion and a greatest dimension of the extension is less than the thickness of the thick rim portion.
A method of polishing a substrate, comprising:
- applying a load to a substrate with a carrier head, the carrier head comprising:
- a retaining ring;
- and
- a flexible membrane configured to press the substrate against a polishing pad, the membrane including an inner surface that forms the boundary of a pressurizable chamber and an outer surface providing a substrate receiving surface;
- wherein the retaining ring surrounds the flexible membrane, the membrane including a horizontal central portion, a vertical portion coupled to the central portion, a thick rim portion coupled to the vertical portion, and an extension coupled to the thick rim portion, the thick rim portion having a thickness that is greater than a portion directly adjacent to the thick rim portion, wherein the thick rim portion is between the extension and the vertical portion and a greatest dimension of the extension is less than the thickness of the thick rim portion;
- and
- creating a relative motion between the substrate and a polishing pad while applying the load.
Dependencies are inferred from the claim text.