Developing apparatus, resist pattern forming method and storage medium

An apparatus to develop a substrate formed with a resist film and exposed, by supplying a developing liquid to the substrate, comprising;

• a mount table configured to mount the substrate horizontally;
• a first supply line configured to supply the developing liquid regulated to a first temperature to a nozzle so that the developing liquid regulated to the first temperature is supplied to the surface of the substrate disposed on the mount table;
• a second supply line configured to supply the developing liquid regulated to a second temperature higher than the first temperature to the nozzle so that the developing liquid regulated to the second temperature is supplied to the surface of the substrate disposed on the mount table;
• at least one temperature regulating unit connected to an upstream side of the first supply line and the second supply line, and configured to regulate the temperature of the developing liquid;
• and
• a control unit configured to output a control signal which allows the first nozzle to supply the developing liquid regulated to the first temperature on the surface of the substrate so as to develop the surface of the substrate and then allows the nozzle to supply the developing liquid regulated to the second temperature on the surface of the substrate,
• wherein at least the first supply line is branched into a plurality of flow paths,
• wherein a temperature sensor is provided at an end portion of the nozzle where the downstream sides of the first supply line and the second supply line are joined together to output a control signal based on a detected temperature to control the flow rate of the developing liquid flowing in the first supply line regulated to the first temperature and the flow rate of the developing liquid flowing in the second supply line regulated to the second temperature,
• wherein the control unit includes a memory that stores in advance a mixing ratio of the developing liquid regulated to the first temperature and the developing liquid regulated to the second temperature corresponding to a difference between a detected temperature at the temperature sensor and a set temperature, and
• wherein the control unit is further configured to control the flow rate of the developing liquid regulated to the first temperature and the flow rate of the developing liquid regulated to the second temperature, when it is determined that the detected temperature and the set temperature are different from each other.