Porous silica precursor composition and method for preparing the precursor composition, porous silica film and method for preparing the porous silica film, semiconductor element, apparatus for displaying an image, as well as liquid crystal display

Abstract

A porous silica precursor composition is herein provided and the precursor composition comprises an organic silane represented by the following chemical formula 1: R1m(R2—O)4-mSi (in the formula, R1 and R2 may be the same or different and each represent an alkyl group, and m is an integer ranging from 0 to 3); water; an alcohol; and a quaternary ammonium compound represented by the following chemical formula 2: R3N(R4)3X (in the formula, R3 and R4 may be the same or different and each represent an alkyl group and X represents a halogen atom). The composition is prepared by a method comprising the step of blending the foregoing components. The porous silica precursor composition is coated on a substrate and then fired to thus form a porous silica film. Also disclosed herein include a semiconductor element, an apparatus for displaying an image and a liquid crystal display, each having the foregoing porous silica film.

Dependencies are inferred from the claim text.