Method for thermal development with supporting surface for a development medium
AssigneeE. I. Du Pont de Nemours and Company
InventorsMark A. Hackler, Anandkumar R. Kannurpatti, Robert A. McMillen, Todd M. Scheske
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Abstract
This invention relates to a method and apparatus for thermally developing a photosensitive element. The thermal development method includes heating the photosensitive element to a temperature sufficient to cause a portion of a composition layer in the element to liquefy, soften, or melt; supporting a development medium with a non-rotating surface to provide contact of the development medium with the heated photosensitive element; and providing relative movement between the development medium and the non-rotating surface.
Claims26
A method for forming a relief pattern from a photosensitive element having an exterior surface and containing a composition layer capable of being partially liquefied comprising:
- heating the exterior surface to a temperature sufficient to cause a portion of the layer to partially liquefy;
- supporting a development medium for contacting with the exterior surface adjacent the partially liquefied portion;
- and
- pressing the development medium and the exterior surface adjacent the partially liquefied portion into contact at a pressure sufficient for at least a portion of the liquefied material of the composition layer to be absorbed and removed in depth by the development medium, to form the relief pattern on the element;
- wherein the supporting step comprises contacting a side of the development medium opposite the partially liquefied portion with a non-rotating surface, and providing relative movement between the development medium and the non-rotating surface to cause the development medium to traverse the non-rotating surface, and
- wherein the supporting step is with a non-rotating support member that is resistant to displacement under operating forces encountered in the method.
Dependencies are inferred from the claim text.