Calibration method of UV sensor for UV curing
AssigneeASM Japan K.K.
InventorHirofumi Arai
Life of this patent
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Abstract
A method for managing UV irradiation for treating substrates in the course of treating multiple substrates consecutively with UV light, includes: exposing a first UV sensor to the UV light at first intervals to measure illumination intensity of the UV light so as to adjust the illumination intensity to a desired level based on the measured illumination intensity; and exposing a second UV sensor to the UV light at second intervals to measure illumination intensity of the UV light so as to calibrate the first UV sensor by equalizing the illumination intensity measured by the first UV sensor substantially with the illumination intensity measured by the second UV sensor, wherein each second interval is longer than each first interval.
Claims20
A method for managing UV irradiation for treating substrates in the course of treating multiple substrates consecutively with UV light, comprising:
- exposing a first UV sensor to the UV light at first intervals to measure illumination intensity of the UV light so as to adjust the illumination intensity to a desired level based on the measured illumination intensity;
- exposing a second UV sensor to the UV light at second intervals to measure illumination intensity of the UV light;
- and
- calibrating the first UV sensor by the second UV sensor to equalize the illumination intensity measured by the first UV sensor substantially with the illumination intensity measured by the second UV sensor, wherein each second interval is longer than each first interval, wherein the first UV sensor and the second UV sensor are disposed inside the same UV unit for treating a substrate adapted to be detachably mounted on a processing chamber wherein the substrate is placed.
A method for processing substrates with UV light, comprising:
- (i) treating substrates consecutively with UV light,
- (ii) exposing a first UV sensor to the UV light at first intervals to measure illumination intensity of the UV light so as to adjust the illumination intensity to a desired level based on the measured illumination intensity;
- (iii) repeating steps (i) and (ii);
- (iv) exposing a second UV sensor to the UV light at second intervals to measure illumination intensity of the UV light;
- and
- (v) calibrating the first UV sensor by the second UV sensor to equalize the illumination intensity measured last by the first UV sensor substantially with the illumination intensity measured by the second UV sensor, wherein each second interval is longer than each first interval, wherein the first UV sensor and the second UV sensor are disposed inside the same UV unit for treating a substrate adapted to be detachably mounted on a processing chamber wherein the substrate is placed.
A UV unit for treating a substrate adapted to be detachably mounted on a processing chamber wherein the substrate is placed, comprising:
- a UV lamp for irradiating UV light;
- a first UV sensor adapted to be exposed to the UV light to measure illumination intensity of the UV light so as to adjust the illumination intensity to a desired level based on the measured illumination intensity;
- a second UV sensor adapted to be exposed to the UV light to measure illumination intensity of the UV light so as to calibrate the first UV sensor by equalizing the illumination intensity measured by the first UV sensor substantially with the illumination intensity measured by the second UV sensor, wherein both the first UV sensor and the second UV sensor are disposed inside the UV unit;
- and
- a control unit for operating the first UV sensor at first intervals and the second UV sensor at second intervals, wherein each second interval is longer than each first interval, calibrating the first UV sensor based on the illumination intensity measured by the second UV sensor, and controlling power of the UV lamp based on the illumination intensity measured by the first UV sensor.
Dependencies are inferred from the claim text.