# US 8,465,803 B2 · Templated monolayer polymerization and replication > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 8,465,803 B2 - Document ID: US8465803B2 - Status: Granted - Kind: B2 - Application number: 13/556,148 - Filed: 2012-07-23 - Published: 2012-11-15 - Granted: 2013-06-18 - Earliest claimed: 2002-07-17 - Assignees: Massachusetts Institute of Technology - Applicants: Joseph M. Jacobson; David W. Mosley - Inventors: Joseph M. Jacobson; David W. Mosley - Web page: https://patentgrep.com/patent/US8465803B2 ## CPC - H10P 14/68: Organic materials, e.g. photoresists - B05D 1/185: {applying monomolecular layers (B05D1/204 takes precedence)} - B82Y 30/00: Nanotechnology for materials or surface science, e.g. nanocomposites - B82Y 40/00: Manufacture or treatment of nanostructures - G01N 31/22: using chemical indicators (G01N31/02 takes precedence) - G03F 7/165: {Monolayers, e.g. Langmuir-Blodgett} - H10P 14/40: of conductive or resistive materials - Y10S 977/882: Assembling of separate components, e.g. by attaching - Y10S 977/883: Fluidic self-assembly, FSA - H10P: GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10 - B05D: PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL (conveying articles or workpieces through baths of liquid B65G, e.g. B65G49/02) - B82Y: SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES - G01N: INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES (measuring or testing apparatus or processes other than immunoassay, involving enzymes or microorganisms C12M, C12Q) - G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G) - Y10S: TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS ## Abstract A self-replicating monolayer system employing polymerization of monomers or nanoparticle ensembles on a defined template provides synthesis of two-dimensional single molecule polymers. Systems of self-replicating monolayers are used as templates for growth of inorganic colloids. A preferred embodiment employs SAM-based replication, wherein an initial monolayer is patterned and used as a template for self-assembly of a second monolayer by molecular recognition. The second monolayer is polymerized in place and the monolayers are separated to form a replicate. Both may then function as templates for monolayer assemblies. A generic self-replicating monomer unit comprises a polymerizable moiety attached by methylene repeats to a recognition element and an ending unit that will not interfere with the chosen recognition chemistry. The recognition element is self-complementary, unless two replicating monomers with compatible cross-linking chemistry are employed. After replication, selective mineralization and/or electroless plating may produce a two-dimensional inorganic sheet having patterned domains within it. ## Claims ### Claim 1 A method for replicating a monolayer, comprising the steps of: forming a first type of template from a subset of a first set of monomers having a first recognition chemistry; binding a subset of a second set of monomers having a second recognition chemistry to the first type of template to form a monolayer replicant of a first replicant type, the second recognition chemistry being complementary to the first recognition chemistry; polymerizing the monolayer replicant of a first replicant type; disassociating the polymerized monolayer replicant of a first replicant type from the first type of template; and forming at least one replicated monolayer by binding monomers from the first set of monomers to a second template type comprising the polymerized monolayer replicant of a first replicant type. ### Claim 2 (depends on 1) The method of claim 1, wherein the monomers are nucleotides, oligonucleotides, or amino acids. ### Claim 3 (depends on 1) The method of claim 1, wherein the monomers are nanoparticle ensembles. ### Claim 4 (depends on 1) The method of claim 1, wherein the monomers contain at least two reactive functional groups. ### Claim 5 (depends on 1) The method of claim 1, wherein the monomers contain a terminus bearing one or more molecular recognition elements. ### Claim 6 (depends on 1) The method of claim 1, wherein the monomers are selected from the group consisting of Hentriaconta-11,13,20,22-tetraynoic acid, Hentriaconta-11,13,20,22-tetraynoic acid amide, Triaconta-10,12,19,21-tetraynoic acid amide, and Triaconta-10,12,19,21-tetraynoic acid. ### Claim 7 (depends on 1) The method of claim 1, further including the step of disassociating the replicated monolayer from the template of a second template type. ### Claim 8 (depends on 1) The method of claim 1, further including the step of growing an inorganic structure upon the replicated monolayer. ### Claim 9 (depends on 1) The method of claim 1, further including the step of selective mineralization of the replicated monolayer. ### Claim 10 (depends on 1) The method of claim 1, further including the step of electroless plating of the replicated monolayer. ### Claim 11 (depends on 1) The method of claim 1, further including the steps of nanoparticle adhesion to, and sintering of, the replicated monolayer. ### Claim 12 A method for replicating a pattern, comprising the steps of: providing a plurality of sets of monomers, each set of monomers having a recognition chemistry; providing a template having a plurality of regions, the template being complementary to the pattern to be replicated and each region of the template being complementary to a different one of the sets of monomers; binding a subset of one of the sets of monomers to each region according to said recognition chemistry, forming a replicate of the pattern; polymerizing the replicate of the pattern; and disassociating the polymerized replicate of the pattern from the template. ### Claim 13 (depends on 12) The method of claim 12, further including the step of binding a plurality of inorganic materials to the replicate of the pattern. ### Claim 14 (depends on 13) The method of claim 13, wherein at least one of the inorganic materials is metallic. ### Claim 15 (depends on 12) The method of claim 12, further including the step of selective mineralization of the replicate of the pattern. ### Claim 16 (depends on 12) The method of claim 12, further including the step of electroless plating of the replicate of the pattern. ### Claim 17 (depends on 12) The method of claim 12, further including the step of growing a semiconductor upon the replicate of the pattern. ### Claim 18 (depends on 12) The method of claim 12, wherein the monomers are nucleotides, oligonucleotides, amino acids, or nanoparticle ensembles. ### Claim 19 (depends on 12) The method of claim 12, wherein the monomers contain at least two reactive functional groups. ### Claim 20 (depends on 12) The method of claim 12, wherein the monomers contain a terminus bearing one or more molecular recognition elements.