# US 8,464,734 B2 · Apparatus for wet processing substrate

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- Number: US 8,464,734 B2
- Document ID: US8464734B2
- Status: Granted
- Kind: B2
- Application number: 12/636,886
- Filed: 2009-12-14
- Published: 2010-07-08
- Granted: 2013-06-18
- Earliest claimed: 2009-01-05
- Assignees: Zhen Ding Technology Co., Ltd.
- Applicants: Wen-Tsun Chen; Shin-Chih Liaw; Tao-Ming Liao; Chia-Hung Shen; Yun-Fei Lien
- Inventors: Wen-Tsun Chen; Shin-Chih Liaw; Tao-Ming Liao; Chia-Hung Shen; Yun-Fei Lien
- Web page: https://patentgrep.com/patent/US8464734B2

## CPC

- C23F 1/08: Apparatus, e.g. for photomechanical printing surfaces (photo- mechanical reproduction G03F)
- B08B 3/022: {Cleaning travelling work (B08B3/042 takes precedence)}
- H05K 3/0085: {Apparatus for treatments of printed circuits with liquids not provided for in groups H05K3/02 - H05K3/46; conveyors and holding means therefor (apparatus specially adapted for manufacturing assemblages of electric components, e.g. printed circuit boards, H05K13/00)}
- H05K 2203/075: Global treatment of printed circuits by fluid spraying, e.g. cleaning a conductive pattern using nozzles
- H05K 2203/1509: Horizontally held PCB
- H05K 2203/163: Monitoring a manufacturing process
- C23F: NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE (working metal by laser beams B23K26/00; desurfacing by applying flames B23K7/00; working of metal by electro-erosion B23H; producing decorative effects by removing surface material, e.g. by engraving, by etching, B44C1/22; electrolytic etching or polishing C25F); INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- B08B: CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- H05K: PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS

## Abstract

An exemplary apparatus for wet processing a substantially rectangular substrate includes a conveyor, a supporting mechanism, an adjusting mechanism, a processing module and a dosing system. The conveyor is configured for conveying the substrate to a wet process work station. The supporting mechanism is configured for supporting the substrate away from the conveyor. The adjusting mechanism is configured for adjusting the orientation of the substrate. The processing module is configured for obtaining an area of a surface of the substrate. The dosing system communicates with the processing unit, and is configured for dispensing a corresponding amount of wet processing liquid to the substrate to wet process the substrate according to the area of the surface of the substrate from the processing module.

## Claims

### Claim 1

An apparatus for wet processing a substrate, the apparatus comprising:
a conveyor configured for conveying a substrate along a first direction, the conveyor comprising a plurality of spaced rollers arranged along the first direction, central axes of the rollers being parallel to a second direction which is perpendicular to the first direction, and the rollers being capable of rotating about respective central axes thereof;
a supporting mechanism capable of moving along a third direction which is perpendicular to the first direction and the second direction, the supporting mechanism being configured for supporting and moving the substrate away from the conveyor, the supporting mechanism comprising a plurality of supporting elements arranged along the first direction, each supporting element arranged between two adjacent rollers, each supporting element comprising a supporting shaft with a central axis parallel to the second direction and a plurality of spaced wheels mounted on the supporting shaft, central axes of the wheels being parallel to the first direction, and the wheels being capable of rotating about respective central axes thereof;
an adjusting mechanism comprising two opposite adjusting plates arranged at opposite sides of the supporting mechanism, respectively, the adjusting plates being capable of moving along a second direction which is perpendicular to the first direction and the third direction to adjust an orientation of the substrate, the adjusting mechanism further comprising at least two driving units, each driving unit comprises a driving wheel, a driven wheel, and a connecting belt mechanically connected between the driving wheel and the driven wheel, wherein a central axis of the driving wheel is parallel to a central axis of the driven wheel and the first direction, the driving wheel is configured for driving the driven wheel to rotate, and each adjusting plate is mechanically connected with at least one driving wheel;
a processing module comprising a first measuring unit adjacent to the conveyor, a second measuring unit mounted on the adjusting mechanism, and a processing unit connected with the first measuring unit and the second measuring unit, the first measuring unit being configured for obtaining a length of the substrate in the first direction, the second measuring unit being configured for obtaining a length of the substrate in the second direction, the processing unit being configured for obtaining an area of a surface of the substrate according to the lengths obtained from the first and second measuring units;
wherein the second measuring unit includes at least one angular displacement sensor mounted on one of the driving wheels;
wherein each adjusting plate has two touch sensors fixed at a surface facing toward the other adjusting plate, and the two touch sensors are aligned along the first direction;
wherein the second measuring unit uses the touch sensors and angular displacement sensor to calculate the length of the substrate in the second direction;
a dosing system configured for dispensing a corresponding amount of wet processing liquid to the substrate to wet process the substrate according to the area of the surface of the substrate obtained from the processing unit.

### Claim 2 (depends on 1)

The apparatus of claim 1, further comprising a spraying system above the conveyor, the spraying system comprising a conduit communicating with the dosing system and a plurality of spray nozzles mounted on the conduit, and the spray nozzles being configured for spraying the corresponding amount of wet processing liquid to the surface of the substrate.

### Claim 3 (depends on 2)

The apparatus of claim 2, further comprising a solution tank below the spray nozzles, the solution tank being configured for collecting wet processing liquid from the spray nozzles.

### Claim 4 (depends on 1)

The apparatus of claim 1, wherein the first measuring unit includes a reflective sensor.

### Claim 5

An apparatus for wet processing a substrate, the substrate comprising a rectangular top surface, two first side surfaces at two opposite sides of the top surface, and two second side surfaces at the other two opposite sides of the top surface, the top surface being perpendicular to the first side surfaces and the second side surfaces, the apparatus comprising:
a conveyor configured for conveying the substrate along a first direction which is parallel to the first side surfaces and the top surface, the conveyor comprising a plurality of spaced rollers arranged along the first direction, central axes of the rollers being parallel to a second direction which is perpendicular to the first direction and parallel to the second side surfaces and the top surface, the rollers being capable of rotating about respective central axes thereof;
a supporting mechanism capable of moving along a third direction which is perpendicular to the first direction and the top surface, the supporting mechanism being configured for supporting and moving the substrate away from the conveyor, the supporting mechanism comprising a plurality of supporting elements arranged along the first direction, each supporting element arranged between two adjacent rollers, each supporting element comprising a supporting shaft with a central axis parallel to the second direction and a plurality of spaced wheels mounted on the supporting shaft, central axes of the wheels being parallel to the first direction, the wheels being capable of rotating about respective central axes thereof;
an adjusting mechanism comprising two opposite adjusting plates which are arranged on opposite sides of the supporting mechanism, respectively, the adjusting plates configured for moving toward each other to be in contact with two first side surfaces of the substrate to adjust the orientation of the substrate on the supporting mechanism, the adjusting mechanism further comprising at least two driving units, each driving unit comprises a driving wheel, a driven wheel, and a connecting belt mechanically connected between the driving wheel and the driven wheel, wherein a central axis of the driving wheel is parallel to a central axis of the driven wheel and the first direction, the driving wheel is configured for driving the driven wheel to rotate, and each adjusting plate is mechanically connected with at least one driving wheel;
a processing module comprising a first measuring unit adjacent to the conveyor, a second measuring unit mounted on the adjusting mechanism, and a processing unit connected with the first measuring unit and the second measuring unit, the first measuring unit being configured for obtaining a length of the first side surfaces of the substrate, the second measuring unit being configured for obtaining a length of the second side surfaces of the substrate, the processing unit being configured for obtaining an area of the top surface of the substrate according to the lengths of the first and second side surfaces;
wherein the second measuring unit includes at least one angular displacement sensor mounted on one of the driving wheels;
wherein each adjusting plate has two touch sensors fixed at a surface facing toward the other adjusting plate, and the two touch sensors are aligned along the first direction;
wherein the second measuring unit uses the touch sensors and angular displacement sensor to calculate the length of the second side surfaces of the substrate;
a dosing system communicating with the processing unit, the dosing system being configured for dispensing a corresponding amount of wet processing liquid to the substrate to wet process the substrate according to the area of the top surface of the substrate obtained from the processing unit.

### Claim 6 (depends on 5)

The apparatus of claim 5, further comprising a spraying system which comprises a conduit communicating with the dosing system and a plurality of spray nozzles mounted on the conduit, the spray nozzles being configured for spraying the corresponding amount of wet processing liquid to the top surface of the substrate.

### Claim 7 (depends on 6)

The apparatus of claim 6, further comprising a solution tank below the spray nozzles, the solution tank being configured for collecting wet processing liquid from the spray nozzles.

### Claim 8 (depends on 5)

The apparatus of claim 5, wherein the first measuring unit includes a reflective sensor.

### Claim 9

An apparatus for wet processing a substrate, the apparatus comprising:
a conveyor configured for conveying the substrate thereon, the conveyor comprising a plurality of spaced rollers arranged along a first direction, central axes of the rollers being parallel to a second direction which is perpendicular to the first direction, and the rollers being capable of rotating about respective central axes thereof;
a supporting mechanism configured for raising the substrate away from the conveyor and lowering the substrate back onto the conveyor along a third direction perpendicular to the first and second directions, the supporting mechanism comprising a plurality of supporting elements arranged along the first direction, each supporting element arranged between two adjacent rollers, each supporting element comprising a supporting shaft with a central axis parallel to the second direction and a plurality of spaced wheels mounted on the supporting shaft, central axes of the wheels being parallel to the first direction, and the wheels being capable of rotating about respective central axes thereof;
an adjusting mechanism comprising two opposite adjusting plates which are arranged on opposite sides of the supporting mechanism, respectively, the adjusting plates configured for moving toward each other to be in contact with two opposite sides of the substrate to adjust and maintain the orientation of the substrate, the adjusting mechanism further comprising at least two driving units, each driving unit comprises a driving wheel, a driven wheel, and a connecting belt mechanically connected between the driving wheel and the driven wheel, wherein a central axis of the driving wheel is parallel to a central axis of the driven wheel and the first direction, the driving wheel is configured for driving the driven wheel to rotate, and each adjusting plate is mechanically connected with at least one driving wheel;
a processing module comprising a length measuring unit, a width measuring unit mounted on the adjusting mechanism, and a processing unit connected with the length measuring unit and the width measuring unit, the length measuring unit being configured for measuring a length of the substrate, the width measuring unit being configured for measuring a width of the substrate, the processing unit being configured for obtaining an area of a surface of the substrate according to the length and the width from the length measuring unit and the width measuring unit, respectively;
wherein the width measuring unit includes at least one angular displacement sensor mounted on one of the driving wheels;
wherein each adjusting plate has two touch sensors fixed at a surface facing toward the other adjusting plate, and the two touch sensors are aligned along the first direction;
wherein the width measuring unit uses the touch sensors and angular displacement sensor to calculate the width of the substrate;
a dosing system communicating with the processing unit, the dosing system being configured for dispensing a particular amount of wet processing liquid to the substrate to wet process the substrate according to the area of the surface of the substrate obtained from the processing unit.

### Claim 10 (depends on 1)

The apparatus of claim 1, wherein the supporting mechanism further comprises a plurality of connecting elements below the rollers, each connecting element including a plurality of first connecting rods each connected with one supporting shaft, and a second connecting rod adjoining the first connecting rods, a longitudinal direction of the second connecting rod being parallel with the first direction, and longitudinal directions of the first connecting rods being parallel with the third direction.

### Claim 11 (depends on 10)

The apparatus of claim 10, wherein the supporting mechanism further comprises a plurality of cylinders, each cylinder having a piston rod which extends along the third direction, the piston rods being connected with the second connecting rods and configured to drive the connecting elements to move along the third direction, making the supporting elements capable of raising a substrate along the third direction.

### Claim 12 (depends on 10)

The apparatus of claim 10, wherein the driving wheels, the driven wheels and the connecting belts are arranged below the rollers.

### Claim 13 (depends on 12)

The apparatus of claim 12, wherein the adjusting mechanism further comprises at least four connecting arms, each adjusting plate being mechanically connected with two driving units via two connecting arms, the adjusting plate being arranged above the rollers.