Method and system for sealing a first assembly to a second assembly of a processing system
AssigneeTokyo Electron Limited
InventorYicheng Li
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AssigneeTokyo Electron Limited
InventorYicheng Li
Estimating the term…
A method, computer readable medium, and system for vapor deposition on a substrate that maintain a first assembly of the vapor deposition system at a first temperature, maintain a second assembly of the vapor deposition system at a reduced temperature lower than the first temperature, dispose the substrate in a process space of the first assembly that is vacuum isolated from a transfer space in the second assembly, and deposit a material on the substrate. As such, the system includes a first assembly having a process space configured to facilitate material deposition, a second assembly coupled to the first assembly and having a transfer space to facilitate transfer of the substrate into and out of the deposition system, a substrate stage connected to the second assembly and configured to support the substrate, and a sealing assembly configured to separate the process space from the transfer space. The first assembly is configured to be maintained at a first temperature and the second assembly is configured to be maintained at a reduced temperature lower than the first temperature.
A sealing device configured to provide a seal between a first assembly of a processing system and a second assembly of the processing system, comprising:
A sealing device configured to provide a seal between a first assembly of a processing system and a second assembly of the processing system, comprising:
Dependencies are inferred from the claim text.