Electromigration-resistant and compliant wire interconnects, nano-sized solder compositions, systems made thereof, and methods of assembling soldered packages

A wire interconnect article comprising:

• a solder bump disposed upon a bond pad that is disposed on a die, wherein the solder bump includes a first metal and a grain size in a range from about 50 nanometer to less than or equal to about 20 micrometer;
• a mounting substrate solder bump that also includes the first metal and that is disposed on a mounting substrate;
• a wire interconnect in contact with the solder bump on the die and the mounting substrate solder bump on the mounting substrate, wherein the wire interconnect is substantially the same metal as the first metal, wherein the wire interconnect has a thickness in a range from about 20 micron to about 120 micron, wherein the wire interconnect includes a height-to-width aspect ratio in a range from 0.5:1 to 5:1, and wherein the wire interconnect includes a composite of a seed layer shell and a plated core;
• and
• a wire interconnect template enveloping the wire interconnect, wherein the wire interconnect template includes an interconnect substrate with an upper surface proximate the die and a lower surface proximate the mounting substrate, wherein the wire interconnect extends at least one of above and below the interconnect substrate.