Dispersions of submicron doped silicon particles
AssigneeNanoGram Corporation
InventorsNobuyuki Kambe, Shivkumar Chiruvolu
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Abstract
Methods are described that have the capability of producing submicron/nanoscale particles, in some embodiments dispersible, at high production rates. In some embodiments, the methods result in the production of particles with an average diameter less than about 75 nanometers that are produced at a rate of at least about 35 grams per hour. In other embodiments, the particles are highly uniform. These methods can be used to form particle collections and/or powder coatings. Powder coatings and corresponding methods are described based on the deposition of highly uniform submicron/nanoscale particles.
Claims21
A dispersion comprising from about 0.075 weight percent to about 30 weight percent doped silicon nanoparticles and a solvent, wherein the nanoparticles have an average primary particle size of about 2 nm to about 100 nm and wherein the nanoparticles comprise a phosphorous dopant.
A dispersion comprising from about 0.075 weigh percent to about 30 weight percent doped silicon nanoparticles and a solvent, wherein the nanoparticles have an average primary particle size of about 2 nm to about 100 nm and an average secondary particle size of less than about 500 nm, and wherein the nanoparticles comprise a boron dopant.
A dispersion comprising from about 0.075 weight percent to about 30 weight percent doped silicon nanoparticles, a surface modifier bonded to the surface of the nanoparticles and a solvent, wherein the nanoparticles have an average primary particle size of about 2 nm to about 100 nm.
Dependencies are inferred from the claim text.