Pattern recognition with edge correction for design based metrology
AssigneeInternational Business Machines Corporation
InventorsTodd C. Bailey, Daniel S. Fischer, Dongbing Shao
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Abstract
Exemplary embodiments include a method for edge correction in pattern recognition, the method including receiving a design layout, receiving a sample plan based on the design layout, receiving user-generated edge input and generating a recipe output from the design layout, the sample plan and the user-generated edge input. The incorporation of the edge input results in SEM recipes that are much more successful in recognizing patterns that have tendency to deviate in appearance from design by, for example, moderate to severe sidewall angle.
Claims25
A method for edge correction in pattern recognition for critical dimension scanning electron microscopy, the method comprising:
- receiving in a processor a design layout, which includes a plurality of devices having a plurality of edges;
- receiving in a processor a sample plan based on the design layout;
- receiving in a processor user-generated edge input, which includes a plurality of secondary lines that are placed adjacent the plurality of edges to mimic wider edges present in a plurality of actual devices, the plurality of secondary lines generated via an offset table defining two extremes of line density of each of the plurality of edges, the two extremes being isolated and dense;
- interpolating, in the processor, the two extremes to determine offsets for an intermediate density of lines for each of the plurality of edges;
- and
- generating in a processor a recipe output from the design layout, the sample plan and the user-generated edge input.
A computer program product for providing edge correction for pattern recognition for critical dimension scanning electron microscopy, the computer program product including a non-transitory computer readable medium instructions for causing a computer to implement a method, the method comprising:
- receiving in a processor a design layout, which includes a plurality of devices having a plurality of edges;
- receiving in a processor a sample plan based on the design layout;
- receiving in a processor user-generated edge input, which includes a plurality of secondary lines that are placed adjacent the plurality of edges to mimic wider edges present in a plurality of actual devices, the plurality of secondary lines generated via an offset table defining two extremes of line density of each of the plurality of edges, the two extremes being isolated and dense;
- interpolating, in the processor, the two extremes to determine offsets for an intermediate density of lines for each of the plurality of edges;
- and
- generating in a processor a recipe output from the design layout, the sample plan and the user-generated edge input.
A system for edge correction in pattern recognition for critical dimension scanning electron microscopy, the system comprising:
- a processor configured to:
- receive a design layout, which includes a plurality of devices having a plurality of edges;
- receive a sample plan based on the design layout;
- receive a user-generated edge input, which includes a plurality of secondary lines that are placed adjacent the plurality of edges to mimic wider edges present in a plurality of actual devices, the plurality of secondary lines generated via an offset table defining two extremes of line density of each of the plurality of edges, the two extremes being isolated and dense;
- interpolate the two extremes to determine offsets for an intermediate density of lines for each of the plurality of edges;
- and
- generate a recipe output from the design layout, the sample plan and the user-generated edge input.
Dependencies are inferred from the claim text.