Surfaced enhanced Raman spectroscopy substrates
AssigneeNant Holdings IP, LLC
InventorsMartin Moskovits, Thomas Wray Tombler, Robert Frank Koefer
Life of this patent
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Abstract
Manufacturing a surface enhanced Raman spectroscopy (SERS) active structure includes exposing a substrate to produce an exposure pattern then etching the substrate based on the exposure pattern to produce a plurality of nanostructure cores having a plurality of sides extending from the substrate. Adjacent nanostructure cores are separated by core gaps. SERS active material is deposited onto the plurality of nanostructure cores producing a structure having gaps suitable for use in a SERS process.
Claims29
A method for manufacturing a surface enhanced Raman spectroscopy (SERS) active structure, said method comprising the steps of:
- etching a substrate to form a plurality of nanostructure cores extending from the substrate;
- depositing SERS active material onto the plurality of nanostructure cores, and
- controlling a surface roughness of the SERS active material to effect Raman excitation.
A method for manufacturing a surface enhanced Raman spectroscopy (SERS) active structure, said method comprising the steps of:
- providing a substrate having a photoresist layer;
- performing lithography by exposing the photoresist layer to an energy source, the photoresist exposed to the energy source forming an exposure pattern on the substrate;
- etching the substrate based on the exposure pattern to produce a plurality of nanostructure cores having a plurality of sides extending from the substrate, adjacent nanostructure cores being separated by core gaps;
- depositing SERS active material onto the plurality of nanostructure cores;
- and
- wherein the step of performing lithography is accomplished by one of laser beam holography, electron beam lithography or deep ultra violet (DUV) photolithography.
A method for manufacturing a surface enhanced Raman spectroscopy (SERS) active structure, said method comprising the steps of:
- providing a substrate having a photoresist layer;
- performing lithography by exposing the photoresist layer to an energy source, the photoresist exposed to the energy source forming an exposure pattern on the substrate;
- etching the substrate based on the exposure pattern to produce a plurality of nanostructure cores having a plurality of sides extending from the substrate, adjacent nanostructure cores being separated by core gaps;
- depositing SERS active material onto the plurality of nanostructure cores;
- and
- performing deposition by one of atomic layer deposition, sputtering, thermal evaporation, electron beam deposition or low pressure chemical vapor deposition.
A method for manufacturing a surface enhanced Raman spectroscopy (SERS) active structure, said method comprising the steps of:
- providing a substrate having a photoresist layer;
- performing laser interference holography by exposing the photoresist layer to an interference pattern generated by a laser at a first pitch and in a first direction to produce an exposure pattern;
- etching the substrate based on the exposure pattern to produce a grating;
- depositing SERS active material onto the grating;
- and,
- wherein the grating is a one-dimensional (1-0) grating and the method further includes depositing the SERS active material preferentially onto at least one side of the 1-0grating.
A method for manufacturing a surface enhanced Raman spectroscopy (SERS) active structure, said method comprising the steps of:
- providing a substrate having a photoresist layer;
- performing laser interference holography by exposing the photoresist layer to an interference pattern generated by a laser at a first pitch and in a first direction to produce an exposure pattern;
- etching the substrate based on the exposure pattern to produce a grating;
- depositing SERS active material onto the grating;
- and
- further including:
- depositing non-SERS-active material preferentially on a top portion of the grating before applying the SERS active material.
A method for manufacturing a surface enhanced Raman spectroscopy (SERS) active structure, said method comprising the steps of:
- providing a substrate having a photoresist layer;
- performing laser interference holography by exposing the photoresist layer to an interference pattern generated by a laser at a first pitch and in a first direction to produce an exposure pattern;
- etching the substrate based on the exposure pattern to produce a grating;
- depositing SERS active material onto the grating;
- and
- further including:
- rotating the substrate at an angle and performing laser interference holography at a second pitch in a second direction to produce a 2-D exposure pattern.
A method for manufacturing a surface enhanced Raman spectroscopy (SERS) active structure, said method comprising the steps of:
- etching a substrate to form a plurality of nanostructure cores extending from the substrate;
- depositing SERS active material onto the plurality of nanostructure cores to produce the SERS active structure having properties that tend to increase SERS activity for a particular analyte to be placed on the SERS active structure, and
- customizing the properties of the SERS active structure by manufacturing the SERS gaps between adjacent SERS active material to have a predetermined size.
A method for manufacturing a surface enhanced Raman spectroscopy (SERS) active structure, said method comprising the steps of:
- forming a layer of material on a substrate;
- etching the layer of material to form a plurality of nanostructure cores
- extending from the substrate;
- and
- depositing SERS active material onto the plurality of nanostructure cores to form the SERS active structure;
- and further including:
- forming
- the layer by depositing silicon oxide on the substrate.
A method for manufacturing a surface enhanced Raman spectroscopy (SERS) active structure, said method comprising the steps of:
- forming a layer of material on a substrate;
- etching the layer of material to form a plurality of nanostructure cores
- extending from the substrate;
- and
- depositing SERS active material onto the plurality of nanostructure cores to form the SERS active structure;
- and further including:
- manufacturing the substrate as silicon and growing the layer as silicon oxide.
Dependencies are inferred from the claim text.