Production method of liquid crystal display including scanning exposure
AssigneeSharp Kabushiki Kaisha
InventorsHiroyuki Hakoi, Iichiro Inoue, Koichi Miyachi
Life of this patent
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Abstract
A production method for making a liquid crystal display device includes subjecting a first alignment film and/or a second alignment film to scanning exposure continuously over a plurality of pixel regions; the scanning exposure including, in an inside of each of a plurality of pixel regions, a first scanning exposure for aligning liquid crystal molecules in a first alignment direction and a second scanning exposure for aligning liquid crystal molecules in a second alignment direction. The second alignment direction may be parallel and opposed to the first alignment direction. In the exposures, a light beam may be made incident from a oblique direction to a normal line on the substrate surface.
Claims20
A production method for making a liquid crystal display device, the method comprising:
- a first substrate;
- a second substrate facing the first substrate;
- a liquid crystal layer provided between at least the first and second substrates;
- a first alignment film provided on the liquid crystal layer side of the first substrate;
- a second alignment film provided on the liquid crystal layer side of the second substrate;
- wherein the production method comprises subjecting the first alignment film and/or the second alignment film to scanning exposure continuously over a plurality of pixel regions;
- the scanning exposure comprising, in an inside of each of a plurality of pixel regions, a first scanning exposure for aligning liquid crystal molecules in a first alignment direction and a second scanning exposure for aligning liquid crystal molecules in a second alignment direction;
- the second alignment direction being parallel and opposed to the first alignment direction;
- in the first scanning exposure and the second scanning exposure, a light beam is made incident from a oblique direction to a normal line on the substrate surface, and
- a light beam emitting direction of the first scanning exposure and a light beam emitting direction of the second scanning exposure are substantially antiparallel each other in the plan view of the substrate, and
- the first alignment film and/or the second alignment film are/is vertical photo-alignment film(s).
Dependencies are inferred from the claim text.