Integrated circuit inductor having a patterned ground shield
AssigneeXilinx, Inc.
InventorsZhaoyin D. Wu, Parag Upadhyahya, Xuewen Jiang, Jing Jing, Shuxian Wu
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Abstract
An inductor structure can be implemented within a semiconductor integrated circuit (IC). The inductor structure can include a coil of conductive material having a first terminal and a second terminal each located at an opposing end of the coil. The inductor structure can include a patterned ground shield including a plurality of fingers implemented within an IC process layer located between the coil of conductive material and a substrate of the IC. The inductor structure also can include an isolation wall formed to encompass the coil and the patterned ground shield. The isolation wall can be coupled to one end of each finger.
Claims20
An inductor structure implemented within a semiconductor integrated circuit (IC), the inductor structure comprising:
- a coil of conductive material comprising a first terminal and a second terminal each located at an opposing end of the coil;
- a patterned ground shield comprising a plurality of fingers implemented within an IC process layer located between the coil of conductive material and a substrate of the IC;
- and
- an isolation wall comprising a high conductive material formed to encompass the coil and the patterned ground shield,
- wherein the isolation wall is coupled to one end of each finger.
Dependencies are inferred from the claim text.