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US 8,426,985 B2Granted
Positive-type photosensitive resin composition, method for producing resist pattern, and electronic component
AssigneeHitachi Chemical Company, Ltd.
InventorsHiroshi Matsutani, Takumi Ueno, Alexandre Nicolas, Ken Nanaumi
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Abstract
A positive tone photosensitive composition comprising: (A) an alkali-soluble resin having a phenolic hydroxyl group; (B) a phenol resin modified by a compound having an unsaturated hydrocarbon group containing 4 to 100 carbon atoms; (C) a compound that generates an acid by the action of light; (D) a thermal cross-linker that crosslinks the ingredient (A) and the ingredient (B) by heating; and (E) a solvent.
Claims15
A positive tone photosensitive composition comprising:
- (A) an alkali-soluble resin having a phenolic hydroxyl group;
- (B) a phenol resin modified by a compound having an unsaturated hydrocarbon group containing 4 to 100 carbon atoms;
- (C) a compound that generates an acid by the action of light;
- (D) a thermal cross-linker;
- and
- (E) a solvent.
3 more elements
Dependencies are inferred from the claim text.