Semiconductor device and method of fabricating the semiconductor device

A semiconductor device comprising:

• a semiconductor substrate with a recess portion formed in an upper surface;
• a supporting body provided around the recess portion on the semiconductor substrate;
• a beam-type movable portion which includes a movable electrode provided above the recess portion and is fixed to the supporting body at a position away from the movable electrode;
• a beam-type fixed electrode provided above the recess portion to be opposed to the movable electrode and fixed to the supporting body;
• and
• isolation regions each including a respective separation column made of a semiconductor and a separation insulating film provided on a side surface of the separation column, the isolation regions being provided between the movable electrode and the supporting body and between the fixed electrode and the supporting body to electrically separate the movable and fixed electrodes from the supporting body,
• wherein the semiconductor substrate and the separation columns have a same crystal orientation, and
• wherein the separation column of the isolation region separating the movable electrode from the supporting body is connected to the semiconductor substrate, and the separation insulating film is continuously provided on side and top surfaces of a corresponding one of the separation columns and on a top surface of the semiconductor substrate.