Fourier transform deflectometry system and method
AssigneeLambda-X
InventorsDidier Beghuin, Luc Joannes
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AssigneeLambda-X
InventorsDidier Beghuin, Luc Joannes
Estimating the term…
The present invention relates to a Fourier transform deflectometry system (1) and method for the optical inspection of a phase and amplitude object (2) placed in an optical path between a grating (3) and an imaging system (4), at a distance h of said grating 3. The grating (3) forms a contrast-based periodic pattern with spatial frequencies μ0, v0 in, respectively, orthogonal axes x,y in an image plane, and the imaging system (4) comprises an objective (5) and an imaging sensor (6) comprising a plurality of photosensitive elements. Spatial frequencies μ0, v0 are equal or lower than the Nyquist frequencies of the imaging system in the respective x and y axes. According to the method of the invention, a first image of said pattern, distorted by the phase and amplitude object (2), is first captured through the objective (5) by the imaging sensor (6). Then, a Fourier transform of said first image in a spatial frequency domain is calculated, at least one first- or higher-order spectrum of said Fourier transform is selected and shifted in said frequency domain, so as to substantially place it at a central frequency of said Fourier transform, and a reverse Fourier transform said at least one shifted first- or higher-order spectrum of said Fourier transform is performed so as to obtain a complex function g(x,y)=l(x,y)eiφ(x,y), wherein l(x,y) is an intensity and φ(x,y) a phase linked to optical deflection angles θx, θy in, respectively, the directions of the x and y axes, in the following form: φ(x,y)=−2ττh(μ0 tan θx+v0 tan θy).
A deflectometry method for the optical inspection of a phase and amplitude object placed in an optical path between a single grating and an imaging system, at a distance h of the grating, wherein the grating forms a contrast-based periodic pattern with the spatial frequencies μ0, v0 in, respectively, orthogonal axes x,y in an image plane, and the imaging system comprises an objective and an imaging sensor comprising a plurality of photosensitive elements, wherein this method comprises the step of:
A deflectometry system for the optical inspection of a phase and amplitude object, comprising:
Dependencies are inferred from the claim text.